SCHEMBL103204

SCHEMBL103204

CCCC(F)(F)C(C)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12236882 0.82 FDPS (0.30)
SCHEMBL25473016 0.81
SCHEMBL23600081 0.81 CES2 (0.33)
SCHEMBL23351230 0.79 CES2 (0.41)
SCHEMBL20792735 0.77
SCHEMBL16473066 0.77
SCHEMBL6536813 0.76
SCHEMBL30814828 0.76
SCHEMBL45499 0.76
SCHEMBL30814731 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11814463-B2 Fluorinated aromatic polymer and method for producing same DAIKIN INDUSTRIES, LTD. (JP) 2023-11-14 US disclosed
US-20230280651-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-07 US disclosed
US-20230265568-A1 MEMBRANE ELECTRODE ASSEMBLY FOR COx REDUCTION TWELVE BENEFIT CORP (US) 2023-08-24 US disclosed
US-20230227604-A1 FLUORINATED AROMATIC POLYMER AND METHOD FOR PRODUCING SAME DAIKIN INDUSTRIES, LTD. (JP) 2023-07-20 US disclosed
US-11680328-B2 Membrane electrode assembly for COx reduction TWELVE BENEFIT CORPORATION (US) 2023-06-20 US disclosed
US-20230155153-A1 CATHODE CATALYSTS FOR CARBON OXIDE ELECTROLYZERS SUMITOMO MITSUI BANKING CORPORATION 2023-05-18 US disclosed
US-20210200083-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-07-01 US disclosed
EP-2102650-B1 APPARATUS FOR PROCESSING A SAMPLE IN A LIQUID DROPLET AGENCY SCIENCE TECH & RES (SG) 2021-05-19 EP disclosed
US-20210141306-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-13 US disclosed
US-20170307486-A1 APPARATUS FOR PROCESSING A SAMPLE IN A LIQUID DROPLET AND METHOD OF USING THE SAME AGENCY SCIENCE TECH & RES (SG) 2017-10-26 US disclosed
CN-101715552-A Apparatus for processing samples in liquid droplets and method of use thereof AGENCY SCIENCE TECH & RES 2010-05-26 CN disclosed
US-20100000304-A1 Apparatus For Performing a Reaction In a Droplet and Method of Using the Same AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (A*STAR) (SG) 2010-01-07 US disclosed
EP-2102650-A1 APPARATUS FOR PROCESSING A SAMPLE IN A LIQUID DROPLET AND METHOD OF USING THE SAME Agency for Science, Technology And Research (SG) 2009-09-23 EP disclosed
EP-2004328-A4 APPARATUS FOR PERFORMING A REACTION IN A DROPLET AND METHOD OF USING THE SAME AGENCY SCIENCE TECH & RES (SG) 2009-07-22 EP disclosed
EP-2004328-A1 APPARATUS FOR PERFORMING A REACTION IN A DROPLET AND METHOD OF USING THE SAME Agency for Science, Technology and Research (SG) 2008-12-24 EP disclosed
US-20080308285-A1 Corrosion resistant sprinklers, nozzles, and related fire protection components and systems FM GLOBAL TECHNOLOGIES, LLC (US) 2008-12-18 US disclosed
WO-2008063135-A1 APPARATUS FOR PROCESSING A SAMPLE IN A LIQUID DROPLET AND METHOD OF USING THE SAME AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) 2008-05-29 WO disclosed
WO-2008063136-A1 APPARATUS FOR PROCESSING A SAMPLE IN A LIQUID DROPLET AND METHOD OF USING THE SAME AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) 2008-05-29 WO disclosed
WO-2007102785-A1 APPARATUS FOR PERFORMING A REACTION IN A DROPLET AND METHOD OF USING THE SAME AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) 2007-09-13 WO disclosed
US-20070023837-A1 Thin film transistor substrate and method of making the same SAMSUNG ELECTRONICS CO., LTD. 2007-02-01 US disclosed