SCHEMBL10320657

SCHEMBL10320657

OCc1c(O)c(O)c(-c2ccccc2)c(CO)c1CO

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC4 P56524 1/20 0.41
HDAC2 Q92769 1/20 0.41
HDAC8 Q9BY41 1/20 0.41
HDAC6 Q9UBN7 1/20 0.41
GCGR P47871 3/20 0.40
PDE4B Q07343 4/20 0.38
PDE4A P27815 3/20 0.38
PDE4C Q08493 3/20 0.38
PDE4D Q08499 3/20 0.38
BACE1 P56817 1/20 0.38
ERBB2 P04626 1/20 0.38
PIM1 P11309 1/20 0.38
HKDC1 Q2TB90 1/20 0.38
HNF4A P41235 1/20 0.37
BCL2L1 Q07817 2/20 0.37
ALDH1A1 P00352 1/20 0.37
HPGD P15428 1/20 0.37
HSD17B10 Q99714 1/20 0.37
TSHR P16473 1/20 0.36
LMNA P02545 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10320519 0.94 ERBB2 (0.43) HDAC4HDAC2HDAC8HDAC6GCGR
SCHEMBL10320031 0.84 GCGR (0.50) HDAC4HDAC2HDAC8HDAC6GCGR
SCHEMBL12679970 0.77 GCGR (0.52) HDAC4HDAC2HDAC8HDAC6GCGR
SCHEMBL5588913 0.73 ESR1 (0.47) GCGRPDE4BPDE4APDE4CPDE4D
SCHEMBL8644874 0.71 PDE4A (0.50) HDAC4HDAC2HDAC8HDAC6PDE4B
SCHEMBL4598394 0.71 PDE4B (0.56) HDAC4HDAC2HDAC8HDAC6PDE4B
SCHEMBL5587529 0.71 KDM4E (0.39) GCGRPDE4BPDE4APDE4CPDE4D
SCHEMBL28031591 0.71 PDCD1 (0.42) HDAC4HDAC2HDAC8HDAC6GCGR
SCHEMBL394025 0.70 SENP1 (0.46) ERBB2PIM1HKDC1BCL2L1MMP3
SCHEMBL7905342 0.70 GCGR (0.42) HDAC4HDAC2HDAC8HDAC6GCGR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090119-B2 Pattern forming method JSR CORPORATION (JP) 2015-07-28 US disclosed
US-20140224765-A1 PATTERN FORMING METHOD JSR CORPORATION (JP) 2014-08-14 US disclosed
US-8715916-B2 Pattern forming method and resist underlayer film-forming composition JSR CORPORATION (JP) 2014-05-06 US disclosed
US-20120181251-A1 PATTERN FORMING METHOD AND RESIST UNDERLAYER FILM-FORMING COMPOSITION JSR CORPORATION (JP) 2012-07-19 US disclosed