Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SENP1 | Q9P0U3 | 3/20 | 0.46 |
| ▸ | ESR1 | P03372 | 5/20 | 0.43 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.43 |
| ▸ | ERBB2 | P04626 | 1/20 | 0.40 |
| ▸ | PIM1 | P11309 | 1/20 | 0.40 |
| ▸ | HKDC1 | Q2TB90 | 1/20 | 0.40 |
| ▸ | MGAM | O43451 | 2/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.39 |
| ▸ | SI | P14410 | 2/20 | 0.39 |
| ▸ | MGAM2 | Q2M2H8 | 2/20 | 0.39 |
| ▸ | USP7 | Q93009 | 3/20 | 0.39 |
| ▸ | PREP | P48147 | 2/20 | 0.37 |
| ▸ | MMP3 | P08254 | 2/20 | 0.37 |
| ▸ | MMP2 | P08253 | 1/20 | 0.37 |
| ▸ | CELA1 | Q9UNI1 | 1/20 | 0.37 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29531084 | 0.76 | ESR1 (0.50) | SENP1ESR1ESR2USP7 | |
| SCHEMBL6058968 | 0.74 | MGAM (0.41) | SENP1ESR1ESR2MGAMGAA | |
| SCHEMBL391836 | 0.72 | SENP1 (0.47) | SENP1ESR1ESR2MGAMGAA | |
| SCHEMBL10320519 | 0.71 | ERBB2 (0.43) | ESR1ESR2ERBB2PIM1HKDC1 | |
| SCHEMBL6013231 | 0.71 | GABRA1 (0.44) | SENP1ESR1ESR2MGAMGAA | |
| SCHEMBL1457230 | 0.71 | ESR1 (0.71) | SENP1ESR1ESR2MMP3BCL2L1 | |
| SCHEMBL3090283 | 0.71 | ERBB2 (0.48) | ERBB2PIM1HKDC1 | |
| SCHEMBL10320657 | 0.70 | HDAC4 (0.41) | ESR1ESR2ERBB2PIM1HKDC1 | |
| SCHEMBL10320031 | 0.69 | GCGR (0.50) | BCL2L1 | |
| SCHEMBL9418421 | 0.68 | MMP3 (0.49) | SENP1ESR1ESR2MMP3MMP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 154 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118099173-A | Solid-state imaging element, method for manufacturing solid-state imaging element, and electronic device | 爱天思株式会社 | 2024-05-28 | — | — | CN | disclosed |
| EP-2553025-B1 | COLORED COMPOSITION, INKJET INK, COLOR FILTER AND METHOD OF PRODUCING THE SAME, SOLID-STATE IMAGE SENSOR AND DISPLAY DEVICE | FUJIFILM CORP (JP) | 2022-01-12 | — | — | EP | disclosed |
| US-9389347-B2 | Colored composition, inkjet ink, color filter and method of producing the same, solid-state image sensor and display device | FUJIFILM CORPORATION (JP) | 2016-07-12 | — | — | US | disclosed |
| EP-2085821-B1 | Dye-containing negative curable composition, color filter and method of producing color filter | FUJIFILM CORP (JP) | 2016-06-01 | — | — | EP | disclosed |
| EP-2275495-B1 | CURABLE COMPOSITION COMPRISING A METAL PHTHALOCYANINE DYE MIXTURE, COLOR FILTER, AND METHOD FOR PRODUCING COLOR FILTER | FUJIFILM CORP (JP) | 2016-04-27 | — | — | EP | disclosed |
| EP-1826200-B1 | Oxime derivative, photopolymerisable composition, colour filter and process for producing the same | FUJIFILM CORP (JP) | 2015-07-08 | — | — | EP | disclosed |
| EP-2348361-B1 | NEGATIVE-TYPE DYE-CONTAINING CURABLE COMPOSITION, COLOR FILTER AND METHOD FOR PRODUCTION THEREOF BOTH UTILIZING THE COMPOSITION, AND SOLID IMAGING ELEMENT | FUJIFILM CORP (JP) | 2014-06-25 | — | — | EP | disclosed |
| US-8728688-B2 | Colored curable composition, color filter and method of producing the same, and dipyrromethene metal complex compound and tautomer thereof | FUJIFILM CORPORATION (JP) | 2014-05-20 | — | — | US | disclosed |
| US-8618193-B2 | Pigment-containing heat-curable composition, color filter, image-recording material, and method of producing color filter | FUJIFILM CORPORATION (JP) | 2013-12-31 | — | — | US | disclosed |
| EP-2413190-B1 | CURABLE COLORING COMPOSITION, COLOR FILTER AND METHOD FOR PRODUCING SAME, AND QUINOPHTHALONE DYE | FUJIFILM CORP (JP) | 2013-12-25 | — | — | EP | disclosed |
| US-20040009414-A1 | Dye-containing curable composition, color filter and method of manufacturing the same | FUJI PHOTO FILM CO., LTD. | 2004-01-15 | — | — | US | disclosed |
| US-20030232259-A1 | Dye-containing curable composition, color filter, and producing process thereof | FUJI PHOTO FILM CO., LTD. | 2003-12-18 | — | — | US | disclosed |
| US-20030229163-A1 | Dye-containing curable composition, color filter prepared using the same, and process of preparing color filter | FUJI PHOTO FILM CO., LTD. | 2003-12-11 | — | — | US | disclosed |
| EP-1348739-A2 | Dye-containing curable composition, color filter prepared using the same, and process of preparing color filter | FUJI PHOTO FILM CO., LTD. (JP) | 2003-10-01 | — | — | EP | disclosed |
| EP-0851300-B1 | Bottom anti-reflective coating material composition and method of forming resist pattern using the same | FUJI PHOTO FILM CO LTD (JP) | 2001-10-24 | — | — | EP | disclosed |
| US-6248500-B1 | ACRYLIC POLYMERS AND PHENOL, NAPHTHOL OR HYDROXYANTHRACENE COMPOUNDS | FUJI PHOTO FILM CO., LTD. (JP) | 2001-06-19 | — | — | US | disclosed |
| US-6165684-A | Bottom anti-reflective coating material composition and method for forming resist pattern using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2000-12-26 | — | — | US | disclosed |
| US-6090531-A | UNDERGOES NO INTERMIXING WITH THE RESIST LAYER, PROVIDES AN EXCELLENT RESIST PATTERN AND SHOWS A HIGHER DRY ETCHING RATE THAN RESIST AND A RESIST PATTERN FORMATION PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2000-07-18 | — | — | US | disclosed |
| EP-0851300-A1 | Bottom anti-reflective coating material composition and method of forming resist pattern using the same | FUJI PHOTO FILM CO., LTD. (JP) | 1998-07-01 | — | — | EP | disclosed |
| EP-0823661-A1 | Composition for anti-reflective coating material | FUJI PHOTO FILM CO., LTD. (JP) | 1998-02-11 | — | — | EP | disclosed |