SCHEMBL10329339

SCHEMBL10329339

C=C(C)C(=O)OCCCC(=O)OC1CCN(C(=O)OC(C)(C)C)C1

nearest known ligand 0.40

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
HPGD P15428 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
FAAH O00519 1/20 0.37
PDE4D Q08499 3/20 0.37
PDE4A P27815 2/20 0.37
PDE4B Q07343 2/20 0.37
PDE4C Q08493 2/20 0.37
PIK3CD O00329 1/20 0.36
RECQL P46063 1/20 0.36
EPHX1 P07099 1/20 0.36
GPR119 Q8TDV5 4/20 0.36
PRMT5 O14744 1/20 0.36
WDR77 Q9BQA1 1/20 0.36
MEN1 O00255 1/20 0.35
ALDH1A1 P00352 1/20 0.35
MAPT P10636 1/20 0.35
KMT2A Q03164 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10329341 0.96 HPGD (0.39) HPGDSMN1; SMN2FAAHPDE4DPDE4A
SCHEMBL10329364 0.91 SMN1; SMN2 (0.36) SMN1; SMN2FAAHPDE4DPDE4APDE4B
SCHEMBL10329351 0.86 HPGD (0.40) HPGDSMN1; SMN2PIK3CDRECQLEPHX1
SCHEMBL10329354 0.86 TSHR (0.36) HPGDSMN1; SMN2FAAHPDE4DPDE4A
SCHEMBL10329355 0.84 SMN1; SMN2 (0.37) SMN1; SMN2FAAHGPR119ALDH1A1
SCHEMBL3455623 0.82 HPGD (0.47) HPGDSMN1; SMN2PIK3CDRECQLEPHX1
SCHEMBL10321396 0.82 HPGD (0.42) HPGDSMN1; SMN2RECQLEPHX1GPR119
SCHEMBL21785171 0.80 SMN1; SMN2 (0.46) HPGDSMN1; SMN2FAAHPDE4DPDE4A
SCHEMBL10329360 0.80 SMN1; SMN2 (0.49) SMN1; SMN2FAAHPDE4BMEN1KMT2A
SCHEMBL10329353 0.79 SMN1; SMN2 (0.36) SMN1; SMN2FAAHGPR119ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9207534-B2 Nitrogen-containing monomer, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-08 US disclosed
US-9207534-B2 Nitrogen-containing monomer, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-08 US disclosed
US-20120183904-A1 NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-07-19 US disclosed
US-20120183904-A1 NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-07-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120183904-A1 NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS PARG, PCNA, PAM HPGD 1852/4885SMN1; SMN2 1320/4885FAAH 2158/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.