SCHEMBL10329353

SCHEMBL10329353

C=CCOC(=O)N1CCC(OC(=O)CCCOC(=O)C(=C)C)CC1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.36
TSHR P16473 3/20 0.35
NAAA Q02083 2/20 0.33
GAA P10253 2/20 0.33
ALDH1A1 P00352 1/20 0.33
FAAH O00519 1/20 0.33
MGLL Q99685 1/20 0.33
NOS3 P29474 1/20 0.33
NOS2 P35228 1/20 0.33
GPR119 Q8TDV5 1/20 0.32
F2 P00734 1/20 0.32
F10 P00742 1/20 0.32
PLG P00747 1/20 0.32
LMNA P02545 1/20 0.31
MAPK1 P28482 1/20 0.31
RAB9A P51151 1/20 0.31
THRB P10828 1/20 0.31
TPSAB1 Q15661 1/20 0.31
TPSD1 Q9BZJ3 1/20 0.31
TPSG1 Q9NRR2 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10329355 0.96 SMN1; SMN2 (0.37) SMN1; SMN2TSHRGAAALDH1A1FAAH
SCHEMBL10329359 0.86 GPR119 (0.34) SMN1; SMN2GAAALDH1A1FAAHNOS3
SCHEMBL10322328 0.84 GAA (0.37) GAAALDH1A1NOS3NOS2GPR119
SCHEMBL10329341 0.83 HPGD (0.39) SMN1; SMN2TSHRFAAHGPR119
SCHEMBL10329362 0.82 F10 (0.35) GAAALDH1A1FAAHMGLLNOS3
SCHEMBL10329367 0.81 TSHR (0.34) TSHRGAAALDH1A1FAAHMGLL
SCHEMBL10329354 0.81 TSHR (0.36) SMN1; SMN2TSHRNAAAFAAHNOS3
SCHEMBL10329340 0.80 SMN1; SMN2 (0.51) SMN1; SMN2FAAHRAB9A
SCHEMBL10329356 0.80 F10 (0.38) GAAALDH1A1FAAHMGLLNOS3
SCHEMBL10329339 0.79 HPGD (0.38) SMN1; SMN2ALDH1A1FAAHGPR119

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9207534-B2 Nitrogen-containing monomer, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-08 US disclosed
US-9207534-B2 Nitrogen-containing monomer, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-08 US disclosed
US-20120183904-A1 NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-07-19 US disclosed
US-20120183904-A1 NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-07-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120183904-A1 NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS PARG, PCNA, PAM SMN1; SMN2 1320/4885TSHR 4708/4885NAAA 18/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.