SCHEMBL10329341

SCHEMBL10329341

C=C(C)C(=O)OCCCC(=O)OC1CCN(C(=O)OC(C)(C)C)CC1

nearest known ligand 0.41

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
HPGD P15428 1/20 0.39
FAAH O00519 1/20 0.39
PDE4D Q08499 3/20 0.38
PDE4A P27815 2/20 0.38
PDE4B Q07343 2/20 0.38
PDE4C Q08493 2/20 0.38
RECQL P46063 1/20 0.38
EPHX1 P07099 1/20 0.38
GPR119 Q8TDV5 6/20 0.37
SMN1; SMN2 Q16637 1/20 0.36
TSHR P16473 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10329339 0.96 HPGD (0.38) HPGDFAAHPDE4DPDE4APDE4B
SCHEMBL10329354 0.90 TSHR (0.36) HPGDFAAHPDE4DPDE4APDE4B
SCHEMBL10329364 0.86 SMN1; SMN2 (0.36) FAAHPDE4DPDE4APDE4BPDE4C
SCHEMBL10321396 0.86 HPGD (0.42) HPGDRECQLEPHX1GPR119SMN1; SMN2
SCHEMBL10329353 0.83 SMN1; SMN2 (0.36) FAAHGPR119SMN1; SMN2TSHR
SCHEMBL10329351 0.81 HPGD (0.40) HPGDRECQLEPHX1GPR119SMN1; SMN2
SCHEMBL3454261 0.81 HPGD (0.49) HPGDRECQLEPHX1GPR119SMN1; SMN2
SCHEMBL10329361 0.80 TSHR (0.35) TSHR
SCHEMBL10329355 0.79 SMN1; SMN2 (0.37) FAAHGPR119SMN1; SMN2TSHR
SCHEMBL10329340 0.79 SMN1; SMN2 (0.51) FAAHSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9207534-B2 Nitrogen-containing monomer, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-08 US disclosed
US-9207534-B2 Nitrogen-containing monomer, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-08 US disclosed
US-20120183904-A1 NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-07-19 US disclosed
US-20120183904-A1 NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-07-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120183904-A1 NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS PARG, PCNA, PAM HPGD 1852/4885FAAH 2158/4885PDE4D 3643/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.