SCHEMBL10329346

SCHEMBL10329346

C=C(C)C(=O)OCC(=O)OC1CCN(C(=O)OC(C)(C)CC)C1

nearest known ligand 0.33

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CETP P11597 1/20 0.32
PIK3CD O00329 4/20 0.32
HPGD P15428 1/20 0.31
GAA P10253 1/20 0.31
PRMT5 O14744 1/20 0.31
WDR77 Q9BQA1 1/20 0.31
PDE4A P27815 1/20 0.31
PDE4B Q07343 1/20 0.31
PDE4C Q08493 1/20 0.31
PDE4D Q08499 1/20 0.31
NOS3 P29474 1/20 0.30
NOS2 P35228 1/20 0.30
RECQL P46063 1/20 0.30
EPHX1 P07099 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10329357 0.95 CETP (0.33) CETPHPGDGAAPDE4APDE4B
SCHEMBL10329351 0.90 HPGD (0.40) PIK3CDHPGDPRMT5WDR77RECQL
SCHEMBL10329338 0.88 HPGD (0.35) CETPPIK3CDHPGDGAAPRMT5
SCHEMBL10329364 0.87 SMN1; SMN2 (0.36) PIK3CDPDE4APDE4BPDE4CPDE4D
SCHEMBL10321396 0.85 HPGD (0.42) HPGDRECQLEPHX1
SCHEMBL10329344 0.83 HPGD (0.36) CETPHPGDGAAPDE4APDE4B
SCHEMBL10329354 0.83 TSHR (0.36) HPGDPDE4APDE4BPDE4CPDE4D
SCHEMBL10329362 0.80 F10 (0.35) GAANOS3NOS2
SCHEMBL10329366 0.78
SCHEMBL10329339 0.77 HPGD (0.38) PIK3CDHPGDPRMT5WDR77PDE4A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9207534-B2 Nitrogen-containing monomer, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-08 US disclosed
US-9207534-B2 Nitrogen-containing monomer, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-08 US disclosed
US-20120183904-A1 NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-07-19 US disclosed
US-20120183904-A1 NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-07-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120183904-A1 NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS PARG, PCNA, PAM CETP 4639/4885PIK3CD 1519/4885HPGD 1852/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.