⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10329352 | 0.90 | ALDH1A1 (0.31) | — | |
| SCHEMBL10329342 | 0.88 | TSHR (0.32) | — | |
| SCHEMBL10329368 | 0.87 | TSHR (0.35) | — | |
| SCHEMBL10329357 | 0.80 | CETP (0.33) | — | |
| SCHEMBL10329348 | 0.80 | ALDH1A1 (0.31) | — | |
| SCHEMBL10329346 | 0.78 | CETP (0.32) | — | |
| SCHEMBL10329361 | 0.77 | TSHR (0.35) | — | |
| SCHEMBL10329349 | 0.76 | TSHR (0.34) | — | |
| SCHEMBL10329365 | 0.75 | HTR2C (0.39) | — | |
| SCHEMBL13398472 | 0.73 | THRB (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9207534-B2 | Nitrogen-containing monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-08 | — | — | US | disclosed |
| US-9207534-B2 | Nitrogen-containing monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-08 | — | — | US | disclosed |
| US-20120183904-A1 | NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120183904-A1 | NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |