SCHEMBL103296

SCHEMBL103296

C=Cc1ccc(OC(=O)c2ccc(C=C)cc2)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 8/20 0.54
MAPT P10636 7/20 0.54
GFER P55789 1/20 0.54
RAB9A P51151 1/20 0.53
HSD17B10 Q99714 1/20 0.52
PARP10 Q53GL7 1/20 0.50
F2 P00734 3/20 0.49
PRSS1 P07477 3/20 0.49
PRSS2 P07478 3/20 0.49
PRSS3 P35030 3/20 0.49
KDM4E B2RXH2 3/20 0.46
GAA P10253 1/20 0.46
ALDH1A1 P00352 2/20 0.45
MEN1 O00255 2/20 0.45
HGFAC Q04756 1/20 0.45
LMNA P02545 1/20 0.44
CYP1A2 P05177 1/20 0.44
CYP2C9 P11712 1/20 0.44
CYP2C19 P33261 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16812851 1.00 KMT2A (0.54) KMT2AMAPTGFERRAB9AHSD17B10
SCHEMBL16812836 0.94 KMT2A (0.50) KMT2AMAPTGFERRAB9AHSD17B10
SCHEMBL12931949 0.94 KMT2A (0.50) KMT2AMAPTGFERRAB9AHSD17B10
SCHEMBL20695774 0.93 KMT2A (0.49) KMT2AMAPTGFERRAB9AHSD17B10
SCHEMBL14348567 0.91 KMT2A (0.48) KMT2AMAPTGFERRAB9AHSD17B10
SCHEMBL1088940 0.91 KMT2A (0.51) KMT2AMAPTGFERRAB9AHSD17B10
SCHEMBL14192394 0.91 MAPT (0.48) KMT2AMAPTGFERRAB9AHSD17B10
SCHEMBL1088035 0.91 KMT2A (0.51) KMT2AMAPTGFERRAB9AHSD17B10
SCHEMBL28924617 0.91 MAPT (0.68) KMT2AMAPTGFERPRSS1KDM4E
SCHEMBL8016262 0.91 KMT2A (0.58) KMT2AMAPTGFERRAB9APRSS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10011773-B2 Liquid crystal display device DIC CORPORATION (JP) 2018-07-03 US disclosed
US-20180100105-A1 ANISOTROPIC SCATTERING FILM DIC CORPORATION (JP) 2018-04-12 US disclosed
US-9828548-B2 Liquid-crystal composition DIC CORPORATION (JP) 2017-11-28 US disclosed
US-9809752-B2 Liquid crystal display device DIC CORPORATION (JP) 2017-11-07 US disclosed
US-9771517-B2 Liquid-crystal optical modulation element DIC CORPORATION (JP) 2017-09-26 US disclosed
US-9410086-B2 Liquid crystal-polymer composite material DIC CORPORATION (JP) 2016-08-09 US disclosed
US-20160215217-A1 LIQUID CRYSTAL DISPLAY DEVICE DIC CORPORATION (JP) 2016-07-28 US disclosed
US-20160130502-A1 LIQUID CRYSTAL DISPLAY DEVICE DIC CORPORATION (JP) 2016-05-12 US disclosed
US-20160017226-A1 LIQUID-CRYSTAL OPTICAL MODULATION ELEMENT DIC CORPORATION (JP) 2016-01-21 US disclosed
US-20150259600-A1 LIQUID-CRYSTAL COMPOSITION DIC CORPORATION (JP) 2015-09-17 US disclosed
US-8405799-B2 Polymer-stabilized liquid crystal composition, liquid crystal display device, method for producing liquid crystal display device DIC CORPORATION (JP) 2013-03-26 US disclosed
US-20120056129-A1 POLYMERIZABLE LIQUID CRYSTAL COMPOSITION DIC CORPORATION (JP) 2012-03-08 US disclosed
US-7871540-B2 Polymerizable liquid crystal composition DIC CORPORATION (JP) 2011-01-18 US disclosed
US-20100149446-A1 POLYMER-STABILIZED LIQUID CRYSTAL COMPOSITION, LIQUID CRYSTAL DISPLAY DEVICE, METHOD FOR PRODUCING LIQUID CRYSTAL DISPLAY DEVICE DIC CORPORATION (JP) 2010-06-17 US disclosed
EP-2146246-A1 Negative resist composition and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2010-01-20 EP disclosed
US-7498126-B2 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-03-03 US disclosed
US-20090050844-A1 POLYMERIZABLE LIQUID CRYSTAL COMPOSITION DIC CORPORATION (JP) 2009-02-26 US disclosed
US-20070292768-A1 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2007-12-20 US disclosed
EP-1791025-A2 Negative resist composition and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2007-05-30 EP disclosed
US-20070111139-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090050844-A1 POLYMERIZABLE LIQUID CRYSTAL COMPOSITION H1-0, H1-4, H1-10 KMT2A 1510/4885MAPT 1343/4885GFER 2929/4885
US-20070292768-A1 Photoacid generators, chemically amplified resist compositions, and patterning process PTH1R, ASIC1, PPA1 KMT2A 1429/4885MAPT 1559/4885GFER 1039/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.