Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS1 | P23219 | 1/20 | 0.45 |
| ▸ | ALDH5A1 | P51649 | 1/20 | 0.44 |
| ▸ | ABAT | P80404 | 1/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 10/20 | 0.42 |
| ▸ | MEN1 | O00255 | 9/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | RAB9A | P51151 | 2/20 | 0.42 |
| ▸ | ESR1 | P03372 | 6/20 | 0.41 |
| ▸ | ESR2 | Q92731 | 4/20 | 0.41 |
| ▸ | CASP3 | P42574 | 2/20 | 0.41 |
| ▸ | SENP8 | Q96LD8 | 2/20 | 0.41 |
| ▸ | SENP7 | Q9BQF6 | 2/20 | 0.41 |
| ▸ | SENP6 | Q9GZR1 | 2/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | PKM | P14618 | 1/20 | 0.41 |
| ▸ | ATM | Q13315 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.40 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10331753 | 0.93 | ALDH5A1 (0.48) | PTGS1ALDH5A1ABATCYP1A2KMT2A | |
| SCHEMBL10331767 | 0.90 | ALDH5A1 (0.52) | PTGS1ALDH5A1ABATCYP1A2KMT2A | |
| SCHEMBL3074283 | 0.88 | ALDH5A1 (0.56) | PTGS1ALDH5A1ABATCYP1A2RAB9A | |
| SCHEMBL19066455 | 0.86 | ALDH5A1 (0.54) | PTGS1ALDH5A1ABATCYP1A2RAB9A | |
| SCHEMBL29794356 | 0.86 | ALDH5A1 (0.58) | PTGS1ALDH5A1ABATCYP1A2RAB9A | |
| SCHEMBL658295 | 0.86 | ALDH5A1 (0.58) | PTGS1ALDH5A1ABATCYP1A2RAB9A | |
| SCHEMBL31473053 | 0.86 | ALDH5A1 (0.58) | PTGS1ALDH5A1ABATCYP1A2RAB9A | |
| SCHEMBL20356051 | 0.84 | CYP1A2 (0.58) | CYP1A2KMT2AMEN1MAPTESR1 | |
| SCHEMBL12054411 | 0.84 | CYP1A2 (0.58) | CYP1A2KMT2AMEN1MAPTESR1 | |
| SCHEMBL12054413 | 0.84 | CYP1A2 (0.58) | CYP1A2KMT2AMEN1MAPTESR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9230827-B2 | Method for forming a resist under layer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-01-05 | — | — | US | disclosed |
| US-9230827-B2 | Method for forming a resist under layer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-01-05 | — | — | US | disclosed |
| US-9046764-B2 | Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| US-9046764-B2 | Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-02 | — | — | US | disclosed |
| US-20140335692-A1 | METHOD FOR FORMING A RESIST UNDER LAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-13 | — | — | US | disclosed |
| US-20140335692-A1 | METHOD FOR FORMING A RESIST UNDER LAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-11-13 | — | — | US | disclosed |
| US-8853031-B2 | Resist underlayer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-07 | — | — | US | disclosed |
| US-8853031-B2 | Resist underlayer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-07 | — | — | US | disclosed |
| US-20130171569-A1 | RESIST UNDERLAYER FILM COMPOSITION, METHOD FOR PRODUCING POLYMER FOR RESIST UNDERLAYER FILM, AND PATTERNING PROCESS USING THE RESIST UNDERLAYER FILM COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-07-04 | — | — | US | disclosed |
| US-20130171569-A1 | RESIST UNDERLAYER FILM COMPOSITION, METHOD FOR PRODUCING POLYMER FOR RESIST UNDERLAYER FILM, AND PATTERNING PROCESS USING THE RESIST UNDERLAYER FILM COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-07-04 | — | — | US | disclosed |
| US-20120184103-A1 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120184103-A1 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |