SCHEMBL1040038

SCHEMBL1040038

Clc1ccccc1-c1nc(-c2ccccc2)c(-c2ccccc2)[nH]1.Clc1ccccc1-c1nc(-c2ccccc2)c(-c2ccccc2)[nH]1

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK13 O15264 8/20 0.67
MAPK12 P53778 8/20 0.67
MAPK11 Q15759 8/20 0.67
MAPK14 Q16539 8/20 0.67
RAF1 P04049 6/20 0.67
MGAM O43451 1/20 0.67
KDM4E B2RXH2 3/20 0.61
POLB P06746 2/20 0.61
MAPK9 P45984 1/20 0.57
GCGR P47871 2/20 0.55
TEK Q02763 1/20 0.55
NT5E P21589 1/20 0.55
ALDH1A1 P00352 2/20 0.54
NPC1 O15118 2/20 0.54
RAB9A P51151 2/20 0.54
GPR55 Q9Y2T6 1/20 0.54
MEN1 O00255 2/20 0.53
KMT2A Q03164 2/20 0.53
CYP1A2 P05177 2/20 0.53
CYP3A4 P08684 2/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29360656 1.00 MAPK13 (0.67) MAPK13MAPK12MAPK11MAPK14RAF1
SCHEMBL306063 1.00 MAPK13 (0.67) MAPK13MAPK12MAPK11MAPK14RAF1
SCHEMBL22507473 0.93 MAPK14 (0.76) MAPK13MAPK12MAPK11MAPK14RAF1
SCHEMBL6468974 0.93 MAPK14 (0.80) MAPK13MAPK12MAPK11MAPK14RAF1
SCHEMBL10719284 0.89 MGAM (0.61) MAPK13MAPK12MAPK11MAPK14RAF1
SCHEMBL3284066 0.88 TEK (0.57) MAPK13MAPK12MAPK11MAPK14RAF1
SCHEMBL20536998 0.88 MGAM (0.60) MAPK13MAPK12MAPK11MAPK14RAF1
SCHEMBL17133348 0.88 MGAM (0.77) MAPK13MAPK12MAPK11MAPK14RAF1
SCHEMBL30514842 0.87 MAPK13 (0.67) MAPK13MAPK12MAPK11MAPK14RAF1
SCHEMBL10078946 0.87 MAPK13 (0.86) MAPK13MAPK12MAPK11MAPK14RAF1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023074722-A1 COMPOSITION FOR FORMING ELECTROCONDUCTIVE ELASTOMER, ELECTROCONDUCTIVE ELASTOMER, AND POLYMER 大阪有機化学工業株式会社 2023-05-04 WO disclosed
US-8148048-B2 Method of processing on-press developable lithographic printing plate having overcoat TENG GARY GANGHUI (US) 2012-04-03 US disclosed
EP-2276446-A1 RADICAL POLYMERISATION INITIATORS FOR LIGHT-CURABLE DENTAL MATERIALS Dentsply DeTrey GmbH (DE) 2011-01-26 EP disclosed
WO-2009135677-A1 RADICAL POLYMERISATION INITIATORS FOR LIGHT-CURABLE DENTAL MATERIALS DENTSPLY DETREY GMBH (DE) 2009-11-12 WO disclosed
US-20090208874-A1 Method of processing on-press developable lithographic printing plate having overcoat TENG GARY GANGHUI 2009-08-20 US disclosed
EP-1717803-A2 Optical information recording media, method for manufacturing the same and method for recording/reproducing optical information Fuji Photo Film Co., Ltd. (JP) 2006-11-02 EP disclosed
EP-1468332-A1 PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE Kodak Polychrome Graphics Company Ltd. (US) 2004-10-20 EP disclosed
EP-1453675-A1 PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE Kodak Polychrome Graphics Company Ltd. (US) 2004-09-08 EP disclosed
WO-2003062924-A1 PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE KODAK POLYCHROME GRAPHICS COMPANY LTD. (US) 2003-07-31 WO disclosed
WO-2003051631-A1 PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE KODAK POLYCHROME GRAPHICS COMPANY LTD. (US) 2003-06-26 WO disclosed
EP-1292861-A2 MULTIDIRECTIONAL PHOTOREACTIVE ABSORPTION METHOD 3M Innovative Properties Company (US) 2003-03-19 EP disclosed
US-20020064728-A1 Near IR sensitive photoimageable/photopolymerizable compositions, media, and associated processes E.I. DU PONT DE NEMOURS AND COMPANY 2002-05-30 US disclosed
WO-2001096959-A2 MULTIDIRECTIONAL PHOTOREACTIVE ABSORPTION METHOD 3M INNOVATIVE PROPERTIES COMPANY (US) 2001-12-20 WO disclosed