Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK13 | O15264 | 8/20 | 0.67 |
| ▸ | MAPK12 | P53778 | 8/20 | 0.67 |
| ▸ | MAPK11 | Q15759 | 8/20 | 0.67 |
| ▸ | MAPK14 | Q16539 | 8/20 | 0.67 |
| ▸ | RAF1 | P04049 | 6/20 | 0.67 |
| ▸ | MGAM | O43451 | 1/20 | 0.67 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.61 |
| ▸ | POLB | P06746 | 2/20 | 0.61 |
| ▸ | MAPK9 | P45984 | 1/20 | 0.57 |
| ▸ | GCGR | P47871 | 2/20 | 0.55 |
| ▸ | TEK | Q02763 | 1/20 | 0.55 |
| ▸ | NT5E | P21589 | 1/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.54 |
| ▸ | NPC1 | O15118 | 2/20 | 0.54 |
| ▸ | RAB9A | P51151 | 2/20 | 0.54 |
| ▸ | GPR55 | Q9Y2T6 | 1/20 | 0.54 |
| ▸ | MEN1 | O00255 | 2/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.53 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.53 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1040038 | 1.00 | MAPK13 (0.67) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL306063 | 1.00 | MAPK13 (0.67) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL22507473 | 0.93 | MAPK14 (0.76) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL6468974 | 0.93 | MAPK14 (0.80) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL10719284 | 0.89 | MGAM (0.61) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL3284066 | 0.88 | TEK (0.57) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL20536998 | 0.88 | MGAM (0.60) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL17133348 | 0.88 | MGAM (0.77) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL30514842 | 0.87 | MAPK13 (0.67) | MAPK13MAPK12MAPK11MAPK14RAF1 | |
| SCHEMBL10078946 | 0.87 | MAPK13 (0.86) | MAPK13MAPK12MAPK11MAPK14RAF1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 561 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114114841-B | Photosensitive resin laminate and method for forming resist pattern | 旭化成株式会社 | 2026-05-12 | — | — | CN | claimed |
| EP-4321541-B1 | RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD AND SEMICONDUCTOR DEVICE | MITSUBISHI GAS CHEMICAL CO (JP) | 2025-08-06 | — | — | EP | claimed |
| US-20250237947-A1 | Dry Film Resist, Photosensitive Dry Film, and Copper Clad Laminate | HANGZHOU FIRST ELECTRONIC MATERIAL CO., LTD (CN) | 2025-07-24 | — | — | US | claimed |
| CN-120122391-A | Photosensitive resin composition containing photobleachable aminomethylanthracene photosensitizer and application thereof | 湖南初源新材料股份有限公司 | 2025-06-10 | — | — | CN | claimed |
| CN-120065628-A | Photosensitive resin composition containing photobleachable dienyl anthracene photosensitizer and application thereof | 湖南初源新材料股份有限公司 | 2025-05-30 | — | — | CN | claimed |
| CN-120040387-A | Diepoxyalkoxyl anthracene photosensitizer, photo-curing resin composition, photosensitive dry film and application | 湖南初源新材料股份有限公司 | 2025-05-27 | — | — | CN | claimed |
| CN-119937245-A | Photosensitive resin composition, photosensitive cover film and electronic component | 杭州福斯特电子材料有限公司 | 2025-05-06 | — | — | CN | claimed |
| CN-119916644-A | Photosensitive resin composition containing alkynyl anthracene photosensitizer and application thereof | 湖南初源新材料股份有限公司 | 2025-05-02 | — | — | CN | claimed |
| CN-119242097-A | Chromium-free Dacromet coating and application method thereof | 重庆置道科技有限公司 | 2025-01-03 | — | — | CN | claimed |
| CN-114755889-B | Dry film resist and photosensitive dry film | 杭州福斯特电子材料有限公司 | 2024-12-31 | — | — | CN | claimed |
| CN-114839839-A | Photosensitive resin composition and dry film anti-corrosion laminated body | 杭州福斯特电子材料有限公司 | 2022-08-02 | — | — | CN | claimed |
| CN-114839836-A | Photosensitive resin composition and dry film resist laminate | 杭州福斯特电子材料有限公司 | 2022-08-02 | — | — | CN | claimed |
| CN-114755889-A | Dry film resist and photosensitive dry film | 杭州福斯特电子材料有限公司 | 2022-07-15 | — | — | CN | claimed |
| CN-114716628-A | LDI photosensitive dry film and preparation method thereof | 河源诚展科技有限公司 | 2022-07-08 | — | — | CN | claimed |
| CN-114660895-A | Dry film resist, photosensitive dry film and copper-clad plate | 杭州福斯特电子材料有限公司 | 2022-06-24 | — | — | CN | claimed |
| CN-109828436-B | High-adhesion etching-resistant photosensitive resin composition | 杭州福斯特电子材料有限公司 | 2022-05-31 | — | — | CN | claimed |
| CN-113174040-B | Photopolymerizable monomer and high-resolution high-adhesion LDI dry film resist composed of photopolymerizable monomer | 杭州福斯特电子材料有限公司 | 2022-05-17 | — | — | CN | claimed |
| CN-114437611-A | Reflective coating for photovoltaic back plate, photovoltaic back plate and preparation method and application of photovoltaic back plate | 福斯特(嘉兴)新材料有限公司 | 2022-05-06 | — | — | CN | claimed |
| CN-114262557-A | Photovoltaic backboard inner layer coating, photovoltaic backboard, preparation method of photovoltaic backboard and photovoltaic module | 福斯特(嘉兴)新材料有限公司 | 2022-04-01 | — | — | CN | claimed |
| CN-110488570-B | Photosensitive resin composition and application thereof | 浙江福斯特新材料研究院有限公司 | 2022-03-11 | — | — | CN | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250237947-A1 | Dry Film Resist, Photosensitive Dry Film, and Copper Clad Laminate | PADI2, PADI4, PADI1 | MAPK13 2751/4885MAPK12 2296/4885MAPK11 3018/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.