Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOA | P21397 | 1/20 | 0.50 |
| ▸ | MAOB | P27338 | 2/20 | 0.48 |
| ▸ | SIGMAR1 | Q99720 | 9/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.45 |
| ▸ | CA1 | P00915 | 1/20 | 0.45 |
| ▸ | CA2 | P00918 | 1/20 | 0.45 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28275035 | 0.98 | SIGMAR1 (0.50) | MAOAMAOBSIGMAR1L3MBTL1MAPT | |
| Water SCHEMBL28757872 | 0.98 | MAOA (0.48) | MAOAMAOBSIGMAR1L3MBTL1CA1 | |
| Tetrabuthylammonium SCHEMBL5468630 | 0.83 | LPL (0.45) | SIGMAR1 | |
| SCHEMBL451456 | 0.78 | MAOA (0.74) | MAOAMAOBSIGMAR1L3MBTL1MAPT | |
| SCHEMBL23969560 | 0.76 | CA1 (0.71) | MAOAMAOBSIGMAR1L3MBTL1CA1 | |
| SCHEMBL5710442 | 0.76 | PCSK9 (0.55) | MAOASIGMAR1CYP2D6 | |
| SCHEMBL8095284 | 0.75 | SIGMAR1 (0.71) | MAOAMAOBSIGMAR1L3MBTL1MAPT | |
| SCHEMBL676854 | 0.75 | SIGMAR1 (0.71) | MAOAMAOBSIGMAR1L3MBTL1MAPT | |
| SCHEMBL8094527 | 0.75 | SIGMAR1 (0.71) | MAOAMAOBSIGMAR1L3MBTL1MAPT | |
| SCHEMBL6443055 | 0.75 | MAOA (0.70) | MAOAMAOBSIGMAR1L3MBTL1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115595001-A | Photosensitive polymer composition, preparation method thereof and holographic diffraction grating element | 杭州光粒科技有限公司（CN） | 2023-01-13 | — | — | CN | claimed |
| CN-1281577-C | Photosensitive quaternary ammonium salt and its preparation method and use | UNIV SUN YAT SEN (CN) | 2006-10-25 | — | — | CN | claimed |
| CN-1634865-A | Photosensitive quaternary ammonium salt and its preparation method and use | UNIV SUN YAT SEN (CN) | 2005-07-06 | — | — | CN | claimed |
| CN-116874714-B | Polyurethane foaming tyre with low hysteresis loss and preparation method thereof | 山东一诺威新材料有限公司 | 2023-12-12 | — | — | CN | disclosed |
| CN-116874714-A | Polyurethane foaming tyre with low hysteresis loss and preparation method thereof | 山东一诺威新材料有限公司 | 2023-10-13 | — | — | CN | disclosed |
| CN-115840347-A | Photopolymer holographic recording material containing mercapto compound, acrylate compound and epoxy compound and grating | 杭州光粒科技有限公司 | 2023-03-24 | — | — | CN | disclosed |
| CN-115595001-A | Photosensitive polymer composition, preparation method thereof and holographic diffraction grating element | 杭州光粒科技有限公司（CN） | 2023-01-13 | — | — | CN | disclosed |
| CN-114647151-A | Photocurable negative photoresist composition, lithographic plate and application thereof | 安徽秀朗新材料科技有限公司 | 2022-06-21 | — | — | CN | disclosed |
| CN-105143885-B | The photosensitizer chemical bleaching of dyestuff | 通用电气医疗集团生物科学公司 | 2019-07-12 | — | — | CN | disclosed |
| CN-104114713-B | Photoactivated chemical bleaching of dyes | 通用电气公司 | 2018-04-03 | — | — | CN | disclosed |
| US-20160334705-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR | KODAK REALTY INC. | 2016-11-17 | — | — | US | disclosed |
| CN-1957300-A | Negative photosensitive composition and negative photosensitive lithography plate | KODAK POLYCHROME GRAPHICS JP (JP) | 2007-05-02 | — | — | CN | disclosed |
| EP-1757982-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION AND NEGATIVE PHOTOSENSITIVE LITHOGRAPHY PLATE | Kodak Polychrome Graphics Japan Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
| CN-1898604-A | Negative photosensitive composition and negative photosensitive lithographic printing plate | KODAK POLYCHROME GRAPHICS JP (JP) | 2007-01-17 | — | — | CN | disclosed |
| US-20060251987-A1 | Negative photosensitive composition and negative photosensitive lithographic printing plate | KODAK (NEAR EAST) INC. | 2006-11-09 | — | — | US | disclosed |
| CN-1281577-C | Photosensitive quaternary ammonium salt and its preparation method and use | UNIV SUN YAT SEN (CN) | 2006-10-25 | — | — | CN | disclosed |
| EP-1708023-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION AND NEGATIVE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE | Kodak Polychrome Graphics Japan Ltd. (JP) | 2006-10-04 | — | — | EP | disclosed |
| EP-1653281-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION AND NEGATIVE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE | Kodak Polychrome Graphics Japan Ltd. (JP) | 2006-05-03 | — | — | EP | disclosed |
| CN-1634865-A | Photosensitive quaternary ammonium salt and its preparation method and use | UNIV SUN YAT SEN (CN) | 2005-07-06 | — | — | CN | disclosed |
| CN-1289415-A | Imaging system employing encapsulated radiation sensitive composition | CYCOLOR INC (US) | 2001-03-28 | — | — | CN | disclosed |