SCHEMBL1040897

SCHEMBL1040897

CCCC(Cc1ccc(C)cc1)(OC)C(=O)O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
ESR1 P03372 2/20 0.38
ESR2 Q92731 2/20 0.38
POLB P06746 1/20 0.38
NR4A1 P22736 1/20 0.38
APEX1 P27695 1/20 0.38
RECQL P46063 1/20 0.38
DUSP3 P51452 1/20 0.38
PTPN5 P54829 1/20 0.38
PTPN11 Q06124 1/20 0.38
CTDSP1 Q9GZU7 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
LMNA P02545 1/20 0.38
GAA P10253 1/20 0.37
HPGD P15428 3/20 0.36
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
PPARG P37231 2/20 0.35
PPARD Q03181 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27780467 0.76 ALDH1A1 (0.42) ALDH1A1SMN1; SMN2RECQLLMNAGAA
SCHEMBL11176953 0.75 LMNA (0.34) ALDH1A1LMNAMEN1KMT2A
SCHEMBL3667015 0.75 SMN1; SMN2 (0.42) ALDH1A1SMN1; SMN2RECQLLMNAKMT2A
SCHEMBL28289195 0.73 SMN1; SMN2 (0.43) ALDH1A1SMN1; SMN2RECQLLMNAPPARG
SCHEMBL13728924 0.71 SMN1; SMN2 (0.46) SMN1; SMN2LMNAPPARGPPARA
SCHEMBL15314315 0.70 ALDH1A1 (0.46) ALDH1A1SMN1; SMN2ESR1ESR2POLB
SCHEMBL16447676 0.69 SMN1; SMN2 (0.50) ALDH1A1SMN1; SMN2RECQLPPARGPPARA
SCHEMBL28057311 0.69 HIF1A (0.46) ALDH1A1SMN1; SMN2RECQLTDP1LMNA
SCHEMBL5160780 0.69 ALDH1A1 (0.49) ALDH1A1POLBPPARD
SCHEMBL5160771 0.69 ALDH1A1 (0.49) ALDH1A1POLBPPARD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7951526-B2 Modified silica particles, and photosensitive composition and photosensitive lithographic printing plate each containing the particles EASTMAN KODAK COMPANY (US) 2011-05-31 US disclosed
EP-1972439-B1 On-press developable lithographic printing plate precursor FUJIFILM CORP (JP) 2011-01-26 EP disclosed
US-20090092923-A1 MODIFIED SILICA PARTICLES, AND PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE EACH CONTAINING THE PARTICLES BANK OF AMERICA, N.A., AS AGENT 2009-04-09 US disclosed
EP-1880978-A1 MODIFIED SILICA PARTICLES, PHOTOSENSITIVE COMPOSITION CONTAINING SAME, AND PHOTOSENSITIVE LITHOGRAPHY PLATE Eastman Kodak Company (US) 2008-01-23 EP disclosed
EP-0320703-A2 Process for the preparation of biuret polyisocyanates, compounds obtained by this process and use BAYER AG (DE) 1989-06-21 EP disclosed