SCHEMBL10411525

SCHEMBL10411525

C=C(C)C(=O)OC(C)OC(=O)c1cccc(S(=O)(=O)ON2C(=O)c3ccccc3C2=O)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 10/20 0.46
▸ KDM4E B2RXH2 10/20 0.46
▸ ALDH1A1 P00352 10/20 0.46
▸ KMT2A Q03164 9/20 0.46
▸ HPGD P15428 7/20 0.46
▸ VDR P11473 3/20 0.44
▸ F2 P00734 4/20 0.43
▸ MEN1 O00255 5/20 0.41
▸ HTT P42858 3/20 0.41
▸ POLB P06746 1/20 0.41
▸ L3MBTL1 Q9Y468 1/20 0.41
▸ XBP1 P17861 2/20 0.39
▸ SMN1; SMN2 Q16637 2/20 0.39
▸ LMNA P02545 2/20 0.39
▸ CYP1A2 P05177 1/20 0.39
▸ CYP3A4 P08684 1/20 0.39
▸ CYP2C19 P33261 1/20 0.39
▸ NPSR1 Q6W5P4 1/20 0.39
▸ HSD17B10 Q99714 1/20 0.36
▸ THRB P10828 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10411543 0.83 VDR (0.48) MAPTKDM4EALDH1A1KMT2AHPGD
SCHEMBL10411526 0.83 MAPT (0.47) MAPTKDM4EALDH1A1KMT2AHPGD
SCHEMBL10409833 0.76 KDM4E (0.52) MAPTKDM4EALDH1A1KMT2AHPGD
SCHEMBL8190350 0.72 TSHR (0.49) MAPTALDH1A1KMT2AF2MEN1
SCHEMBL22251709 0.72 VDR (0.60) MAPTKDM4EALDH1A1KMT2AHPGD
SCHEMBL7543881 0.68 CA12 (0.37) MAPTALDH1A1KMT2AMEN1SMN1; SMN2
SCHEMBL10409867 0.67 KDM4E (0.71) MAPTKDM4EALDH1A1KMT2AHPGD
SCHEMBL64368 0.67 KDM4E (1.00) MAPTKDM4EALDH1A1KMT2AHPGD
SCHEMBL28844888 0.67 KMT2A (0.72) MAPTKDM4EALDH1A1KMT2AHPGD
SCHEMBL29938470 0.67 KMT2A (0.72) MAPTKDM4EALDH1A1KMT2AHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4957988-A Process and polymers for the production of images CIBA-GEIGY CORPORATION (US) 1990-09-18 — — US disclosed
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