⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL80807 | 0.74 | — | — | |
| SCHEMBL6553040 | 0.74 | — | — | |
| SCHEMBL12236595 | 0.65 | — | — | |
| SCHEMBL31715324 | 0.62 | — | — | |
| SCHEMBL2562820 | 0.60 | — | — | |
| SCHEMBL3751552 | 0.59 | ALDH1A1 (0.30) | — | |
| SCHEMBL22407 | 0.59 | ALDH1A1 (0.30) | — | |
| SCHEMBL20212036 | 0.59 | ALDH1A1 (0.30) | — | |
| SCHEMBL20586 | 0.59 | — | — | |
| Fluoride SCHEMBL634472 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 108 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250313953-A1 | METHODS AND SYSTEMS FOR FORMING DOPED SILICON NITRIDE FILMS | ASM IP HOLDING B.V. (NL) | 2025-10-09 | — | — | US | claimed |
| US-20250297360-A1 | SUBSTRATE PROCESSING METHOD | ASM IP HOLDING B.V. (NL) | 2025-09-25 | — | — | US | claimed |
| US-12392038-B2 | Thin-film deposition method and system | ASM IP HOLDING B.V. (NL) | 2025-08-19 | — | — | US | claimed |
| US-20250253145-A1 | SUBSTRATE PROCESSING METHOD | ASM IP HOLDING B.V. (NL) | 2025-08-07 | — | — | US | claimed |
| US-12378667-B2 | Methods and systems for forming doped silicon nitride films | ASM IP HOLDING B.V. (NL) | 2025-08-05 | — | — | US | claimed |
| US-20230279031-A1 | N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM | GELEST, INC. | 2023-09-07 | — | — | US | claimed |
| US-20230126516-A1 | METHODS AND SYSTEMS FOR FORMING DOPED SILICON NITRIDE FILMS | ASM IP HOLDING B.V. (NL) | 2023-04-27 | — | — | US | claimed |
| US-20230098270-A1 | PRECURSORS FOR HIGH-TEMPERATURE DEPOSITION OF SILICON-CONTAINING FILMS | LAM RESEARCH CORPORATION | 2023-03-30 | — | — | US | claimed |
| US-20230089397-A1 | AIR GAP FORMING METHOD AND SELECTIVE DEPOSITION METHOD | ASM IP HOLDING B.V. (NL) | 2023-03-23 | — | — | US | claimed |
| CN-115807217-A | Air gap forming method and selective deposition method | ASM IP私人控股有限公司 | 2023-03-17 | — | — | CN | claimed |
| CN-114622183-A | Method for preparing silicon oxide film | 湖南红太阳光电科技有限公司 | 2022-06-14 | — | — | CN | claimed |
| EP-3274354-B1 | N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM | GELEST TECH INC (US) | 2019-07-03 | — | — | EP | claimed |
| US-9887080-B2 | Method of forming SiOCN material layer and method of fabricating semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-02-06 | — | — | US | claimed |
| EP-3274354-A1 | N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM | Gelest Technologies Inc. (US) | 2018-01-31 | — | — | EP | claimed |
| US-20170186603-A1 | METHOD OF FORMING SiOCN MATERIAL LAYER AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-06-29 | — | — | US | claimed |
| US-20160280724-A1 | N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM | GELEST, INC. | 2016-09-29 | — | — | US | claimed |
| WO-2016153929-A1 | N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM | GELEST TECHNOLOGIES, INC. (US) | 2016-09-29 | — | — | WO | claimed |
| US-20260092360-A1 | CYCLICAL DEPOSITION METHOD INCLUDING TREATMENT STEP AND APPARATUS FOR SAME | ASM IP HOLDING BV (NL) | 2026-04-02 | — | — | US | disclosed |
| EP-1724373-A1 | Precursors for cvd silicon carbo-nitride films | Air Products and Chemicals, Inc. (US) | 2006-11-22 | — | — | EP | disclosed |
| US-20060258173-A1 | Precursors for CVD silicon carbo-nitride films | VERSUM MATERIALS US, LLC | 2006-11-16 | — | — | US | disclosed |