⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1047729 | 0.79 | — | — | |
| SCHEMBL1045321 | 0.74 | — | — | |
| SCHEMBL6553040 | 0.70 | — | — | |
| SCHEMBL22407 | 0.56 | ALDH1A1 (0.30) | — | |
| SCHEMBL27977434 | 0.56 | ALDH1A1 (0.30) | — | |
| SCHEMBL3751552 | 0.56 | ALDH1A1 (0.30) | — | |
| SCHEMBL20586 | 0.56 | — | — | |
| SCHEMBL20212036 | 0.56 | ALDH1A1 (0.30) | — | |
| Water SCHEMBL2864553 | 0.53 | — | — | |
| Ammonia Solution, Strong SCHEMBL2883129 | 0.53 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2653 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4748968-A1 | METHOD FOR FORMING THIN FILM USING TWO TYPES OF SILICON PRECURSOR COMPOUNDS | Hansol Chemical Co., Ltd (KR) | 2026-05-27 | — | — | EP | claimed |
| CN-114695264-B | Semiconductor memory structure and method for filling conductive material in contact hole | INSTITUTE OF MICROELECTRONICS OF THE CHINESE ACADEMY OF SCIENCES (CN) | 2026-05-26 | — | — | CN | claimed |
| US-12635185-B2 | Thin film transistor substrate and display apparatus comprising the same | LG DISPLAY CO., LTD. (KR) | 2026-05-19 | — | — | US | claimed |
| US-20260136855-A1 | METHOD OF SELECTIVE DEPOSITION ON SUBSTRATE, SUBSTRATE FABRICATED THEREBY, SEMICONDUCTOR DEVICE, AND ELECTRONIC DEVICE COMPRISING SAME | SAMSUNG ELECTRONICS CO LTD (KR) | 2026-05-14 | — | — | US | claimed |
| US-12628578-B2 | Substrate processing method | ASM IP HOLDING B.V. (NL) | 2026-05-12 | — | — | US | claimed |
| EP-4719364-A1 | PREPARATION OF PHARMACEUTICAL COMPOSITIONS USING SUPERCYCLE VAPOR PHASE DEPOSITION OF INORGANIC OXIDES | Applied Materials, Inc. (US) | 2026-04-08 | — | — | EP | claimed |
| US-12559838-B2 | Sealing structure and manufacturing method therefor | IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY) (KR) | 2026-02-24 | — | — | US | claimed |
| US-12554191-B2 | Pellicle membrane and method of forming the same | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-02-17 | — | — | US | claimed |
| US-20260041086-A1 | PROCESS FOR PREPARING COATED ORGANIC PARTICLES | BASF SE (DE) | 2026-02-12 | — | — | US | claimed |
| US-12546000-B2 | Substrate processing method | ASM IP HOLDING B.V. (NL) | 2026-02-10 | — | — | US | claimed |
| US-20080242116-A1 | Method for forming strained silicon nitride films and a device containing such films | TOKYO ELECTRON LIMITED (JP) | 2008-10-02 | — | — | US | claimed |
| US-20080213479-A1 | SiCN film formation method and apparatus | TOKYO ELECTRON LIMITED | 2008-09-04 | — | — | US | claimed |
| EP-1939323-A1 | Cyclic chemical vapor deposition of metal-silicon containing films | Air Products and Chemicals, Inc. (US) | 2008-07-02 | — | — | EP | claimed |
| US-20080142046-A1 | Thermal F2 etch process for cleaning CVD chambers | AIR PRODUCTS AND CHEMICALS, INC. | 2008-06-19 | — | — | US | claimed |
| EP-1932941-A1 | Thermal etch process for cleaning CVD chambers | Air Products and Chemicals, Inc. (US) | 2008-06-18 | — | — | EP | claimed |
| US-20080081470-A1 | Method for forming strained silicon nitride films and a device containing such films | TOKYO ELECTRON LIMITED (JP) | 2008-04-03 | — | — | US | claimed |
| US-20080058541-A1 | Stabilization of nitrogen-containing and oxygen-containing organosilanes using weakly basic ion-exchange resins | VERSUM MATERIALS US, LLC | 2008-03-06 | — | — | US | claimed |
| EP-1894934-A1 | Stabilization of Nitrogen-Containing and Oxygen-Containing Organosilanes Using Weakly Basic Ion-Exchange Resins | Air Products and Chemicals, Inc. (US) | 2008-03-05 | — | — | EP | claimed |
| US-20070275166-A1 | Process for producing silicon oxide films from organoaminosilane precursors | VERSUM MATERIALS US, LLC | 2007-11-29 | — | — | US | claimed |
| EP-1860690-A2 | Process for producing silicon oxide films from organoaminosilane precursors | Air Products and Chemicals, Inc. (US) | 2007-11-28 | — | — | EP | claimed |