⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1045321 | 0.74 | — | — | |
| SCHEMBL80807 | 0.70 | — | — | |
| SCHEMBL20586 | 0.67 | — | — | |
| SCHEMBL27977434 | 0.67 | ALDH1A1 (0.30) | — | |
| SCHEMBL35296 | 0.65 | — | — | |
| SCHEMBL43239 | 0.63 | — | — | |
| Hydrochloric Acid SCHEMBL15233791 | 0.63 | — | — | |
| Iodide SCHEMBL30960110 | 0.63 | — | — | |
| Ammonia Solution, Strong SCHEMBL2883129 | 0.63 | — | — | |
| SCHEMBL16904036 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116003079-A | Method for producing autoclaved concrete slab by using magnesium ore slag | 江门市俞嘉科技有限公司 | 2023-04-25 | — | — | CN | claimed |
| EP-3535436-B1 | PRECURSORS AND FLOWABLE CVD METHODS FOR MAKING LOW-K FILMS TO FILL SURFACE FEATURES | VERSUM MAT US LLC (US) | 2021-05-12 | — | — | EP | claimed |
| US-10580644-B2 | Method and apparatus for selective film deposition using a cyclic treatment | TOKYO ELECTRON LIMITED (JP) | 2020-03-03 | — | — | US | claimed |
| US-9153597-B2 | Methods of manufacturing a three-dimensional semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2015-10-06 | — | — | US | claimed |
| US-20130078776-A1 | Methods of Manufacturing a Three-Dimensional Semiconductor Device | SAMSUNG ELECTRONICS CO., LTD. | 2013-03-28 | — | — | US | claimed |
| CN-101587304-B | Pattern transferring method | SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION (CN) | 2011-11-30 | — | — | CN | claimed |
| CN-101484984-B | Post-treatment method of amorphous carbon film | TOKYO ELECTRON LTD | 2010-12-15 | — | — | CN | claimed |
| CN-101640170-A | Photoetching method capable of reducing width of exposure pattern | SEMICONDUCTOR MFG INT SHANGHAI | 2010-02-03 | — | — | CN | claimed |
| CN-101587304-A | Pattern transferring method | SEMICONDUCTOR MFG INT BEIJING (CN) | 2009-11-25 | — | — | CN | claimed |
| CN-101484984-A | Post-treatment method of amorphous carbon film | TOKYO ELECTRON LTD (JP) | 2009-07-15 | — | — | CN | claimed |
| CN-116003079-B | Method for producing autoclaved concrete slab by using magnesium ore slag | 江门市俞嘉科技有限公司 | 2024-08-20 | — | — | CN | disclosed |
| US-11735413-B2 | Precursors and flowable CVD methods for making low-k films to fill surface features | VERSUM MATERIALS US, LLC (US) | 2023-08-22 | — | — | US | disclosed |
| CN-116003079-A | Method for producing autoclaved concrete slab by using magnesium ore slag | 江门市俞嘉科技有限公司 | 2023-04-25 | — | — | CN | disclosed |
| CN-114388427-A | Method and system for forming silicon nitride on sidewalls of features | ASM IP私人控股有限公司 | 2022-04-22 | — | — | CN | disclosed |
| EP-3390410-B1 | METHODS OF MAKING HIGH PURITY TRISILYLAMINE | NATA SEMICONDUCTOR MAT CO LTD (CN) | 2022-02-02 | — | — | EP | disclosed |
| EP-1059314-A1 | A resist composition | Wako Pure Chemical Industries, Ltd. (JP) | 2000-12-13 | — | — | EP | disclosed |
| CN-1252788-A | Process for preparing pharmaceutical compounds | LILLY CO ELI (US) | 2000-05-10 | — | — | CN | disclosed |
| US-5990345-A | Process for preparation of ethylenically unsaturated isocyanates | NOVARTIS AG (CH) | 1999-11-23 | — | — | US | disclosed |
| CN-1140452-A | Arthropodicidal tetrahydropyrimidines | DU PONT (US) | 1997-01-15 | — | — | CN | disclosed |
| CN-1132504-A | Inhibitors of beta-amyloid production | MURRILL MEDICINES CO (US) | 1996-10-02 | — | — | CN | disclosed |