SCHEMBL1045377

SCHEMBL1045377

CCCCOc1ccc(C[P+](c2ccccc2)(c2ccccc2)c2ccccc2)cc1.F[B-](F)(F)F

nearest known ligand 0.50

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 2/20 0.50
SNCA P37840 2/20 0.44
CHRNA7 P36544 8/20 0.43
PPARG P37231 1/20 0.42
PPARD Q03181 1/20 0.42
PPARA Q07869 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL1044358 0.92 LTA4H (0.54) LTA4HSNCACHRNA7
Iodide SCHEMBL1047429 0.92 LTA4H (0.54) LTA4HSNCACHRNA7
Hydrochloric Acid SCHEMBL1046793 0.92 LTA4H (0.54) LTA4HSNCACHRNA7
SCHEMBL3694644 0.89 LTA4H (0.47) LTA4HSNCACHRNA7PPARGPPARD
SCHEMBL8372241 0.88 LTA4H (0.50) LTA4HSNCACHRNA7PPARGPPARA
Bromide SCHEMBL5571267 0.88 LTA4H (0.55) LTA4HSNCACHRNA7
SCHEMBL8378569 0.88 LTA4H (0.50) LTA4HSNCACHRNA7PPARGPPARA
SCHEMBL1150154 0.87 LTA4H (0.43) LTA4HSNCACHRNA7PPARGPPARD
Acetic Acid SCHEMBL1042649 0.85 LTA4H (0.46) LTA4HPPARGPPARDPPARA
Bromide SCHEMBL9336662 0.83 KCNA3 (0.55) LTA4HSNCACHRNA7PPARGPPARD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8450231-B2 Silicon-containing particles, method for manufacturing thereof, oil composition, ceramic material, and method for manufacturing thereof DOW CORNING TORAY COMPANY, LTD. (JP) 2013-05-28 US disclosed
EP-2461397-A1 ELECTRODE ACTIVE MATERIAL, ELECTRODE, AND ELECTRICITY STORAGE DEVICE Dow Corning Toray Co., Ltd. (JP) 2012-06-06 EP disclosed
US-20120121981-A1 Electrode Active Material, Electrode, And Electricity Storage Device DOW CORNING TORAY CO., LTD. (JP) 2012-05-17 US disclosed
US-20110045963-A1 Silicon-Containing Particles, Method For Manufacturing Thereof, Oil Composition, Ceramic Material, And Method For Manufacturing Thereof DOW CORNING TORAY COMPANY, LTD. (JP) 2011-02-24 US disclosed
EP-2271702-A2 SILICON-CONTAINING PARTICLES, METHOD FOR MANUFACTURING THEREOF, OIL COMPOSITION, CERAMIC MATERIAL, AND METHOD FOR MANUFACTURING THEREOF Dow Corning Toray Co., Ltd. (JP) 2011-01-12 EP disclosed
WO-2009133765-A2 SILICON-CONTAINING PARTICLES, METHOD FOR MANUFACTURING THEREOF, OIL COMPOSITION, CERAMIC MATERIAL, AND METHOD FOR MANUFACTURING THEREOF DOW CORNING TORAY CO., LTD. (JP) 2009-11-05 WO disclosed