Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 4/20 | 0.52 |
| ▸ | ESR2 | Q92731 | 4/20 | 0.52 |
| ▸ | PRKCE | Q02156 | 3/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | MYLK | Q15746 | 2/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | MAPT | P10636 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.40 |
| ▸ | PRKCG | P05129 | 1/20 | 0.40 |
| ▸ | PRKCA | P17252 | 1/20 | 0.40 |
| ▸ | APEX1 | P27695 | 1/20 | 0.40 |
| ▸ | RECQL | P46063 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.35 |
| ▸ | HTT | P42858 | 2/20 | 0.35 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10452199 | 0.94 | ESR1 (0.46) | ESR1ESR2PRKCEALDH1A1MYLK | |
| SCHEMBL3359241 | 0.94 | ESR1 (0.50) | ESR1ESR2PRKCEALDH1A1MYLK | |
| SCHEMBL10138161 | 0.89 | PRKCE (0.47) | ESR1ESR2PRKCEALDH1A1MYLK | |
| SCHEMBL11059959 | 0.87 | ESR1 (0.52) | ESR1ESR2PRKCEALDH1A1MYLK | |
| SCHEMBL14997936 | 0.87 | ESR1 (0.40) | ESR1ESR2PRKCEALDH1A1MYLK | |
| SCHEMBL1089974 | 0.85 | ALOX15 (0.45) | ESR1ESR2PRKCEALDH1A1MYLK | |
| SCHEMBL17665007 | 0.84 | PRKCE (0.38) | ESR1ESR2PRKCEALDH1A1MYLK | |
| SCHEMBL24767320 | 0.83 | PRKCE (0.42) | PRKCEALDH1A1MYLKMEN1MAPT | |
| SCHEMBL17356549 | 0.83 | PRKCE (0.42) | ESR1ESR2PRKCEALDH1A1MYLK | |
| SCHEMBL20461212 | 0.83 | PRKCE (0.42) | PRKCEALDH1A1MYLKMEN1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113840849-B | Resin composition, electronic component, and method for producing resin film | 日本瑞翁株式会社 | 2023-03-28 | — | — | CN | disclosed |
| CN-110366704-B | Radiation-sensitive resin composition and electronic component | 日本瑞翁株式会社（JP） | 2023-01-13 | — | — | CN | disclosed |
| CN-113396182-B | Resin composition, electronic component, and method for producing resin film | 日本瑞翁株式会社（JP） | 2023-01-13 | — | — | CN | disclosed |
| CN-111770964-B | Resin composition and electronic component | 日本瑞翁株式会社 | 2022-12-02 | — | — | CN | disclosed |
| CN-108885398-B | Radiation-sensitive resin composition and electronic component | 日本瑞翁株式会社 | 2022-11-29 | — | — | CN | disclosed |
| CN-114402258-A | Radiation-sensitive resin composition | 日本瑞翁株式会社 | 2022-04-26 | — | — | CN | disclosed |
| CN-113840849-A | Resin composition, electronic component, and method for producing resin film | 日本瑞翁株式会社 | 2021-12-24 | — | — | CN | disclosed |
| CN-113396182-A | Resin composition, electronic component, and method for producing resin film | 日本瑞翁株式会社 | 2021-09-14 | — | — | CN | disclosed |
| CN-107922742-B | Resin composition | 日本瑞翁株式会社 | 2021-01-15 | — | — | CN | disclosed |
| CN-111770964-A | Resin composition and electronic component | 日本瑞翁株式会社 | 2020-10-13 | — | — | CN | disclosed |
| CN-106104380-B | Radiation-sensitive resin composition and electronic component | 日本瑞翁株式会社 | 2020-03-06 | — | — | CN | disclosed |
| US-9090119-B2 | Pattern forming method | JSR CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| US-8828640-B2 | Photo-curing polysiloxane composition and application thereof | CHI MEI CORPORATION (TW) | 2014-09-09 | — | — | US | disclosed |
| US-20140224765-A1 | PATTERN FORMING METHOD | JSR CORPORATION (JP) | 2014-08-14 | — | — | US | disclosed |
| US-20120181251-A1 | PATTERN FORMING METHOD AND RESIST UNDERLAYER FILM-FORMING COMPOSITION | JSR CORPORATION (JP) | 2012-07-19 | — | — | US | disclosed |