SCHEMBL24767320

SCHEMBL24767320

COCc1cc(C(C)(c2cc(COC)c(O)c(COC)c2)c2cc(COC)c(O)c(COC)c2)cc(CO)c1O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PRKCE Q02156 3/20 0.42
MYLK Q15746 2/20 0.42
MEN1 O00255 1/20 0.42
ALDH1A1 P00352 1/20 0.42
PRKCG P05129 1/20 0.42
MAPT P10636 1/20 0.42
PRKCA P17252 1/20 0.42
APEX1 P27695 1/20 0.42
RECQL P46063 1/20 0.42
KMT2A Q03164 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
KLF10 Q13118 1/20 0.41
SHBG P04278 1/20 0.38
HTT P42858 2/20 0.37
CYP2C19 P33261 1/20 0.37
ALOX15 P16050 1/20 0.37
MAPK1 P28482 1/20 0.37
PDE4A P27815 1/20 0.32
PDE4B Q07343 1/20 0.32
PDE4C Q08493 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20461212 1.00 PRKCE (0.42) PRKCEMYLKMEN1ALDH1A1PRKCG
SCHEMBL29310149 0.94 PRKCE (0.38) PRKCEMYLKMEN1ALDH1A1PRKCG
SCHEMBL10138161 0.93 PRKCE (0.47) PRKCEMYLKMEN1ALDH1A1PRKCG
SCHEMBL18387304 0.91 PRKCE (0.36) PRKCEMYLKMEN1ALDH1A1PRKCG
SCHEMBL24149957 0.89 KLF10 (0.47) PRKCEMYLKMEN1ALDH1A1PRKCG
SCHEMBL29310140 0.89 ALOX15 (0.49) PRKCEMYLKMEN1ALDH1A1PRKCG
SCHEMBL29331671 0.89 ALOX15 (0.49) PRKCEMYLKMEN1ALDH1A1PRKCG
SCHEMBL19828148 0.88 PRKCE (0.34) PRKCEMYLKMEN1ALDH1A1PRKCG
SCHEMBL2618700 0.87 KLF10 (0.50) ALDH1A1RECQLTDP1KLF10SHBG
SCHEMBL10114799 0.86 PRKCE (0.40) PRKCEMYLKMEN1ALDH1A1PRKCG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11720024-B2 Resist underlayer film-forming composition containing indolocarbazole novolak resin NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2023-08-08 US disclosed
US-20220404707-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZOLE NOVOLAK RESIN NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2022-12-22 US disclosed