SCHEMBL10479147

SCHEMBL10479147

CC1Oc2c(O)cccc2C1C

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACHE P22303 1/20 0.37
OPRD1 P41143 1/20 0.36
BRD4 O60885 3/20 0.36
MAOA P21397 2/20 0.35
MAOB P27338 2/20 0.35
CES2 O00748 1/20 0.33
DRD2 P14416 1/20 0.33
HTR1A P08908 1/20 0.32
ADAMTS4 O75173 1/20 0.32
ALDH1A1 P00352 1/20 0.32
EGFR P00533 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
LMNA P02545 1/20 0.32
FYN P06241 1/20 0.32
MMP2 P08253 1/20 0.32
MMP9 P14780 1/20 0.32
HPGD P15428 1/20 0.32
ALOX15 P16050 1/20 0.32
MMP8 P22894 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11172073 0.87 BRD4 (0.47) ACHEOPRD1BRD4MAOAMAOB
SCHEMBL14934302 0.78 BRD4 (0.37) ACHEBRD4HTR1AALDH1A1CA1
SCHEMBL18536296 0.76 MEN1 (0.37) ACHEBRD4HTR1A
SCHEMBL9138249 0.76 MAOA (0.50) MAOAMAOBCES2ALDH1A1LMNA
SCHEMBL9138244 0.76 MAOA (0.50) MAOAMAOBCES2ALDH1A1LMNA
SCHEMBL9139207 0.76 MAOA (0.50) MAOAMAOBCES2ALDH1A1LMNA
SCHEMBL9139202 0.76 MAOA (0.50) MAOAMAOBCES2ALDH1A1LMNA
SCHEMBL9138240 0.76 MAOA (0.50) MAOAMAOBCES2ALDH1A1LMNA
SCHEMBL2926588 0.74 BRD4 (0.51) BRD4ALDH1A1CA1CA2LMNA
SCHEMBL11115478 0.73 ACHE (0.36) ACHEOPRD1MAOAMAOBCES2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7510820-B2 Resist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-03-31 US disclosed
US-7416833-B2 Photoresist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-08-26 US disclosed
US-20070122740-A1 Resist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-31 US disclosed
US-4851587-A Single solvent process for preparing 2-methallyloxy-phenol from catechol FMC CORPORATION (US) 1989-07-25 US disclosed
US-4562266-A Process for the preparation of 2,3-dihydro-2,2-dimethyl-7-benzofuranol ENICHIMICA SECONDARIA, S.P.A. (IT) 1985-12-31 US disclosed
US-4540800-A FROM CATECHOL, ALDEHYDE OR ALLYL ALCOHOL, SOLID ACID CATALYST UBE INDUSTRIES, LTD. (JP) 1985-09-10 US disclosed
EP-0123357-A2 Process for the preparation of 2,3-bihydro-2,2-dimethyl-7-benzofuranol ENICHIMICA SECONDARIA S.p.A. (IT) 1984-10-31 EP disclosed