Biphenyl

Biphenyl

SCHEMBL1048244

CO[SiH](OC)OC.c1ccc(-c2ccccc2)cc1

nearest known ligand 0.53

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.53
MAPT P10636 4/20 0.43
MEN1 O00255 1/20 0.43
TSHR P16473 1/20 0.43
KMT2A Q03164 1/20 0.43
ATM Q13315 1/20 0.43
AKT1 P31749 1/20 0.42
AKT2 P31751 1/20 0.42
SLC22A2 O15244 1/20 0.42
SLC22A1 O15245 1/20 0.42
SLC22A3 O75751 1/20 0.42
SLC6A4 P31645 1/20 0.42
CA4 P22748 1/20 0.41
PDE4B Q07343 2/20 0.41
CYP1A2 P05177 2/20 0.39
MAPK1 P28482 1/20 0.39
LMNA P02545 1/20 0.39
HTT P42858 1/20 0.39
CYP3A4 P08684 1/20 0.39
TAAR1 Q96RJ0 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Biphenyl SCHEMBL27679775 0.92 ALDH1A1 (0.45) ALDH1A1MAPTMEN1TSHRKMT2A
SCHEMBL9804317 0.84 ESR2 (0.38) ALDH1A1TSHRMAPK1CYP3A4HSD17B10
Biphenyl SCHEMBL3908169 0.81 ALDH1A1 (0.69) ALDH1A1MAPTMEN1TSHRKMT2A
Biphenyl SCHEMBL28881047 0.81 ALDH1A1 (0.69) ALDH1A1MAPTMEN1TSHRKMT2A
Benzene SCHEMBL5026200 0.80 CA4 (0.32) CA4
SCHEMBL28599067 0.80 CYP3A4 (0.52) MAPTMEN1TSHRKMT2AATM
Toluene SCHEMBL2550635 0.80 ACHE (0.61) ALDH1A1MAPTMEN1TSHRKMT2A
Biphenyl SCHEMBL27322104 0.80 ALDH1A1 (0.50) ALDH1A1MAPTMEN1TSHRKMT2A
Naphthalene SCHEMBL22472004 0.79 CYP2A6 (0.50) ALDH1A1MAPTMEN1TSHRKMT2A
Naphthalene SCHEMBL27806519 0.79 CYP2A6 (0.50) ALDH1A1MAPTMEN1TSHRKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1138051-A Process for obtaining ethylene-propylene elastomer copolymers with high purity and controlled moelcular weight distribution ENICHEM ELASTOMERS (IT) 1996-12-18 CN claimed
EP-0731114-A1 Process for obtaining ethylene-propylene elastomer copolymers with a high purity and controlled molecular weight distribution ENICHEM ELASTOMERI S.r.l. (IT) 1996-09-11 EP claimed
EP-0492966-B1 A stereospecific catalyst system intended for the polymerization of olefins BOREALIS AS (DK) 1996-08-21 EP claimed
US-5227355-A STEREOSPECIFIC CATALYST SYSTEM INTENDED FOR THE POLYMERIZATION OF OLEFINS Seppala, Jukka (FI) 1993-07-13 US claimed
CN-117957494-A Resin composition, light-shielding film, and substrate with partition wall 东丽株式会社 2024-04-30 CN disclosed
US-11733609-B2 Silicon-containing underlayers ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2023-08-22 US disclosed
CN-115322509-B Composite Janus particle, manufacturing method thereof, coating and laminated body 清华大学 2023-07-25 CN disclosed
US-11692093-B2 Resin composition, method for producing three-dimensional molding using same, and three-dimensional molding Konica Minolta, Inc. (JP) 2023-07-04 US disclosed
CN-109765758-B First layer containing silicon 罗门哈斯电子材料有限责任公司 2023-04-18 CN disclosed
WO-2023048016-A1 RESIN COMPOSITION, LIGHT-SHIELDING FILM, AND SUBSTRATE WITH PARTITIONING WALL 東レ株式会社 2023-03-30 WO disclosed
US-11360387-B2 Silicon-containing underlayers ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2022-06-14 US disclosed
US-20210397093-A1 SILICON-CONTAINING UNDERLAYERS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2021-12-23 US disclosed
US-20020064666-A1 Article having uneven surface, production process for the article, and composition for the process SHINMO KATSUHIDE (JP) 2002-05-30 US disclosed
CN-1350031-A Fire-retardant resin composition, preliminary-dip piece, laminated board, metal cladded laminated board, printed circuit-board and multi-layer printed circuit board HITACHI CHEMICAL CO LTD (JP) 2002-05-22 CN disclosed
US-6361718-B1 MOLDING POLYSILOXANE FILMS FROM SILANOLS AND SILANE HALIDES; HEAT RESISTANT AND NONCRACKING; USED TO MANUFACTURE OPTICAL RECORDING MEDIA NIPPON SHEET GLASS CO., LTD. (JP) 2002-03-26 US disclosed
EP-1142682-A1 METHOD FOR PRODUCING ARTICLE HAVING PREDETERMINED SURFACE SHAPE, AND OPTICAL WAVEGUIDE ELEMENT Nippon Sheet Glass Co., Ltd. (JP) 2001-10-10 EP disclosed
EP-1118884-A1 ECHELON DIFFRACTION GRATING AND OPTICAL WAVEGUIDE ELEMENT Nippon Sheet Glass Co., Ltd. (JP) 2001-07-25 EP disclosed
EP-0985510-A1 ARTICLE WITH ROUGH SURFACE, PROCESS FOR PRODUCING THE SAME, AND COMPOSITION THEREFOR Nippon Sheet Glass Co., Ltd. (JP) 2000-03-15 EP disclosed
EP-0492966-B1 A stereospecific catalyst system intended for the polymerization of olefins BOREALIS AS (DK) 1996-08-21 EP disclosed
EP-0492966-A2 A stereospecific catalyst system intended for the polymerization of olefins BOREALIS A/S (DK) 1992-07-01 EP disclosed