Naphthalene

Naphthalene

SCHEMBL22472004

CO[SiH](OC)OC.CO[SiH](OC)OC.c1ccc2ccccc2c1

nearest known ligand 0.50

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2A6 P11509 6/20 0.50
ALOX12 P18054 1/20 0.50
CYP1A2 P05177 3/20 0.46
NQO1 P15559 1/20 0.39
CA4 P22748 2/20 0.38
CA12 O43570 1/20 0.38
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
CA7 P43166 1/20 0.38
CA9 Q16790 1/20 0.38
CA14 Q9ULX7 1/20 0.38
TDP1 Q9NUW8 2/20 0.38
NQO2 P16083 4/20 0.37
MAPT P10636 2/20 0.36
KDM4E B2RXH2 2/20 0.35
ALDH1A1 P00352 2/20 0.35
MAPK1 P28482 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
TSHR P16473 2/20 0.34
MEN1 O00255 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Naphthalene SCHEMBL27806519 1.00 CYP2A6 (0.50) CYP2A6ALOX12CYP1A2NQO1CA4
Anthracene SCHEMBL28592266 0.88 CYP2A6 (0.48) CYP2A6ALOX12CYP1A2NQO1CA4
Naphthalene SCHEMBL8679262 0.79 CYP2A6 (0.67) CYP2A6ALOX12CYP1A2NQO1CA4
O-Xylene SCHEMBL28287795 0.79 TSHR (0.59) CYP2A6CYP1A2CA4CA12CA1
Biphenyl SCHEMBL1048244 0.79 ALDH1A1 (0.53) CYP1A2CA4TDP1MAPTALDH1A1
Naphthalene SCHEMBL28245954 0.79 CYP2A6 (0.47) CYP2A6ALOX12CYP1A2NQO1CA4
Toluene SCHEMBL2550635 0.77 ACHE (0.61) ALOX12CA4CA12CA1CA2
SCHEMBL5701976 0.77 P2RX4 (0.38) ALOX12CA4CA12CA1CA2
Naphthalene SCHEMBL3263116 0.76 CYP2A6 (0.61) CYP2A6ALOX12CYP1A2NQO1CA4
Benzene SCHEMBL5026200 0.75 CA4 (0.32) CA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240231230-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-07-11 US disclosed
CN-117716295-A Composition for forming silicon-containing resist underlayer film and silicon-containing resist underlayer film 日产化学株式会社 2024-03-15 CN disclosed
CN-117255971-A Composition for forming silicon-containing resist underlayer film 日产化学株式会社 2023-12-19 CN disclosed
US-20220206395-A1 COMPOSITION FOR RESIST PATTERN METALLIZATION PROCESS NISSAN CHEMICAL CORPORATION (JP) 2022-06-30 US disclosed
WO-2020196563-A1 FILM-FORMING COMPOSITION 日産化学株式会社 2020-10-01 WO disclosed
WO-2020196642-A1 FILM-FORMING COMPOSITION 日産化学株式会社 2020-10-01 WO disclosed