SCHEMBL10488771

SCHEMBL10488771

[N-]=[N+]=NS(=O)(=O)c1ccc(/N=N/c2c(O)nc3ccccc3c2O)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 6/20 0.42
KMT2A Q03164 6/20 0.42
MAPT P10636 3/20 0.42
POLB P06746 3/20 0.40
USP2 O75604 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
CA9 Q16790 6/20 0.39
CA12 O43570 5/20 0.39
CA1 P00915 5/20 0.39
CA2 P00918 5/20 0.39
CDK1 P06493 1/20 0.38
CDK2 P24941 1/20 0.38
S100A4 P26447 1/20 0.38
CYP2D6 P10635 1/20 0.38
CYP1A2 P05177 1/20 0.35
CYP3A4 P08684 1/20 0.35
STAT6 P42226 1/20 0.35
HIF1A Q16665 1/20 0.35
RAB9A P51151 3/20 0.35
IDE P14735 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10488773 1.00 MEN1 (0.42) MEN1KMT2AMAPTPOLBUSP2
SCHEMBL15329034 0.83 POLB (0.58) MEN1KMT2AMAPTPOLBUSP2
SCHEMBL11696241 0.79 THRB (0.51) MEN1KMT2AMAPTPOLBUSP2
SCHEMBL11696248 0.79 THRB (0.51) MEN1KMT2AMAPTPOLBUSP2
SCHEMBL10488358 0.79 MAPT (0.69) MEN1KMT2AMAPTPOLBUSP2
SCHEMBL10488361 0.79 MAPT (0.69) MEN1KMT2AMAPTPOLBUSP2
SCHEMBL7775236 0.74 IDO1 (0.51) MEN1KMT2AMAPTPOLBUSP2
SCHEMBL10488961 0.74 MAPT (0.52) MEN1KMT2AMAPTPOLBUSP2
SCHEMBL10488959 0.74 MAPT (0.52) MEN1KMT2AMAPTPOLBUSP2
SCHEMBL10488863 0.73 LMNA (0.57) MEN1KMT2AMAPTPOLBTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4835089-A Resist pattern forming process with dry etching HITACHI, LTD. (JP) 1989-05-30 US claimed