⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Boric Acid SCHEMBL31258782 | 0.83 | LMNA (0.31) | — | |
| SCHEMBL31173118 | 0.83 | — | — | |
| Boric Acid SCHEMBL31172975 | 0.83 | LMNA (0.31) | — | |
| Phosphoric Acid SCHEMBL31173015 | 0.78 | PGK1 (0.36) | — | |
| SCHEMBL852287 | 0.67 | — | — | |
| Norflurane SCHEMBL11036325 | 0.59 | — | — | |
| Norflurane SCHEMBL5466910 | 0.59 | — | — | |
| Norflurane SCHEMBL1173735 | 0.59 | — | — | |
| SCHEMBL25287 | 0.59 | — | — | |
| SCHEMBL166134 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024217291-A1 | SECONDARY BATTERY AND PREPARATION METHOD THEREFOR AND ELECTRIC DEVICE | 华为技术有限公司 | 2024-10-24 | — | — | WO | claimed |
| CN-118725484-A | Nanoparticle grafted fluorosilane coupling agent compatibilized fluorine/silicon rubber and preparation method thereof | 超能材料科技(大连)有限公司 | 2024-10-01 | — | — | CN | claimed |
| EP-2011834-B1 | CURABLE COMPOSITION | KANEKA CORP (JP) | 2012-07-25 | — | — | EP | claimed |
| US-12418046-B2 | Nonaqueous electrolyte solution | MITSUBISHI CHEMICAL CORPORATION (JP) | 2025-09-16 | — | — | US | disclosed |
| US-20250260058-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS-ELECTROLYTIC-SOLUTION BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2025-08-14 | — | — | US | disclosed |
| WO-2024217291-A1 | SECONDARY BATTERY AND PREPARATION METHOD THEREFOR AND ELECTRIC DEVICE | 华为技术有限公司 | 2024-10-24 | — | — | WO | disclosed |
| CN-118725484-A | Nanoparticle grafted fluorosilane coupling agent compatibilized fluorine/silicon rubber and preparation method thereof | 超能材料科技(大连)有限公司 | 2024-10-01 | — | — | CN | disclosed |
| CN-118048095-A | Preparation process of solvent-free epoxy composite coating | 江西百盛精细化学品有限公司 | 2024-05-17 | — | — | CN | disclosed |
| CN-114207901-B | Nonaqueous electrolyte solution and nonaqueous electrolyte battery | 三菱化学株式会社 | 2024-04-09 | — | — | CN | disclosed |
| EP-4175001-A1 | NONAQUEOUS ELECTROLYTIC SOLUTION AND NONAQUEOUS ELECTROLYTIC SOLUTION BATTERY | Mitsubishi Chemical Corporation (JP) | 2023-05-03 | — | — | EP | disclosed |
| US-20230125746-A1 | Nonaqueous Electrolytic Solution and Nonaqueous Electrolytic Solution Battery | MITSUBISHI CHEMICAL CORPORATION (JP) | 2023-04-27 | — | — | US | disclosed |
| CN-101426859-A | Curable composition | KANEGAFUCHI CHEMICAL IND (JP) | 2009-05-06 | — | — | CN | disclosed |
| US-20090069505-A1 | CURABLE COMPOSITION | KANEKA CORPORATION (JP) | 2009-03-12 | — | — | US | disclosed |
| EP-2011834-A1 | CURABLE COMPOSITION | Kaneka Corporation (JP) | 2009-01-07 | — | — | EP | disclosed |
| EP-1931613-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FujiFilm Electronic Materials USA, Inc. (US) | 2008-06-18 | — | — | EP | disclosed |
| EP-1931746-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FujiFilm Electronic Materials USA, Inc. (US) | 2008-06-18 | — | — | EP | disclosed |
| WO-2007033075-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2007-03-22 | — | — | WO | disclosed |
| WO-2007033123-A2 | ADDITIVES TO PREVENT DEGRADATION OF CYCLIC ALKENE DERIVATIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2007-03-22 | — | — | WO | disclosed |
| US-20070057235-A1 | Additives to prevent degradation of cyclic alkene derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2007-03-15 | — | — | US | disclosed |
| US-20070057234-A1 | Additives to prevent degradation of cyclic alkene derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2007-03-15 | — | — | US | disclosed |