Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.58 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.58 |
| ▸ | MEN1 | O00255 | 2/20 | 0.58 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.58 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.48 |
| ▸ | SNCA | P37840 | 2/20 | 0.46 |
| ▸ | AGER | Q15109 | 3/20 | 0.44 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1427866 | 0.88 | ALDH1A1 (0.48) | ALDH1A1KMT2AMEN1KDM4EL3MBTL1 | |
| SCHEMBL28840600 | 0.87 | ALDH1A1 (0.50) | ALDH1A1KMT2AMEN1KDM4EL3MBTL1 | |
| SCHEMBL2310221 | 0.85 | MGLL (0.47) | ALDH1A1KMT2AMEN1KDM4E | |
| SCHEMBL3705822 | 0.84 | ALDH1A1 (0.47) | ALDH1A1KMT2AMEN1KDM4EL3MBTL1 | |
| SCHEMBL29458899 | 0.84 | KMT2A (0.44) | ALDH1A1KMT2AMEN1KDM4EL3MBTL1 | |
| SCHEMBL9200469 | 0.82 | KMT2A (0.49) | ALDH1A1KMT2AMEN1KDM4EL3MBTL1 | |
| SCHEMBL9200471 | 0.82 | KMT2A (0.49) | ALDH1A1KMT2AMEN1KDM4EL3MBTL1 | |
| SCHEMBL8895608 | 0.80 | KDM4E (0.57) | ALDH1A1KMT2AMEN1KDM4EL3MBTL1 | |
| SCHEMBL29874435 | 0.80 | KDM4E (0.57) | ALDH1A1KMT2AMEN1KDM4EL3MBTL1 | |
| Hydrochloric Acid SCHEMBL8816016 | 0.78 | KDM4E (0.56) | ALDH1A1KMT2AMEN1KDM4EL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 152 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8367190-B2 | At low temperature, fast hardening composition for preparing protecting film, protecting film prepared therefrom, and substrate comprising the same | LG CHEM, LTD. (KR) | 2013-02-05 | — | — | US | claimed |
| US-20100080973-A1 | LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2010-04-01 | — | — | US | claimed |
| WO-2008035890-A9 | AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEMICAL LTD (KR) | 2009-04-23 | — | — | WO | claimed |
| WO-2008035890-A1 | AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2008-03-27 | — | — | WO | claimed |
| US-6743572-B2 | OVERCOATING WITH ZONES OF FILM FORMING POLYMER; HEATING PHOTORESISTS; DEVELOPMENT | INFINEON TECHNOLOGIES AG (DE) | 2004-06-01 | — | — | US | claimed |
| US-20020187436-A1 | Method for structuring a photoresist layer | POLARIS INNOVATIONS LIMITED (IE) | 2002-12-12 | — | — | US | claimed |
| US-12607931-B2 | Photosensitive transfer material, light shielding material, LED array, and electronic apparatus | FUJIFILM CORPORATION (JP) | 2026-04-21 | — | — | US | disclosed |
| WO-2025099025-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST FILM USING THE SAME | MERCK PATENT GMBH (DE) | 2025-05-15 | — | — | WO | disclosed |
| WO-2025013746-A1 | PATTERN-FORMING COMPOSITION | 日産化学株式会社 | 2025-01-16 | — | — | WO | disclosed |
| CN-118047765-A | Dielectric material | 默克专利股份有限公司 | 2024-05-17 | — | — | CN | disclosed |
| US-20240049386-A1 | LAMINATE AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-02-08 | — | — | US | disclosed |
| WO-2024024864-A1 | PHOTOSENSITIVE TRANSFER MATERIAL, METHOD FOR MANUFACTURING SAME, METHOD FOR MANUFACTURING RESIN PATTERN, AND METHOD FOR MANUFACTURING CIRCUIT WIRING | 富士フイルム株式会社 | 2024-02-01 | — | — | WO | disclosed |
| US-20240030030-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | JSR CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| WO-2008035890-A1 | AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2008-03-27 | — | — | WO | disclosed |
| US-20070185263-A1 | COMPOSITION FOR FORMING SILICA-BASED COATING WITH A LOW REFRACTIVE INDEX | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-08-09 | — | — | US | disclosed |
| US-20060292488-A1 | Composition for formation of antireflection film, and antireflection film in which the same is used | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-12-28 | — | — | US | disclosed |
| US-20050130082-A1 | Developing solution for photoresist | ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. | 2005-06-16 | — | — | US | disclosed |
| US-20050112503-A1 | Developing solution for photoresist | ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. | 2005-05-26 | — | — | US | disclosed |
| US-6743572-B2 | OVERCOATING WITH ZONES OF FILM FORMING POLYMER; HEATING PHOTORESISTS; DEVELOPMENT | INFINEON TECHNOLOGIES AG (DE) | 2004-06-01 | — | — | US | disclosed |
| US-20020187436-A1 | Method for structuring a photoresist layer | POLARIS INNOVATIONS LIMITED (IE) | 2002-12-12 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12607931-B2 | Photosensitive transfer material, light shielding material, LED array, and electronic apparatus | SETD1B, NLRP1, MAP1LC3B | ALDH1A1 1082/4885KMT2A 291/4885MEN1 2743/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.