⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8006729 | 0.75 | PKM (0.33) | — | |
| SCHEMBL16801683 | 0.75 | — | — | |
| SCHEMBL4370719 | 0.75 | — | — | |
| SCHEMBL29086467 | 0.73 | — | — | |
| SCHEMBL891799 | 0.71 | PKM (0.30) | — | |
| SCHEMBL6898990 | 0.69 | THRB (0.36) | — | |
| SCHEMBL8936497 | 0.68 | — | — | |
| SCHEMBL1361764 | 0.67 | — | — | |
| SCHEMBL15021707 | 0.67 | — | — | |
| SCHEMBL28216370 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 626 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1218886-C | Degradation method for fluorine-containing ether and method for treating fluofine-containing ether sewage | SHANGHAI 3F NEW MATERIALS CO L (CN) | 2005-09-14 | — | — | CN | claimed |
| US-4960947-A | Process for producing hexafluoroacetone or its hydrate | NIPPON MEKTRON LIMITED (JP) | 1990-10-02 | — | — | US | claimed |
| JP-61126068-A | — | — | None | — | — | JP | disclosed |
| JP-60184062-A | — | — | None | — | — | JP | disclosed |
| JP-59196872-A | — | — | None | — | — | JP | disclosed |
| JP-61126074-A | — | — | None | — | — | JP | disclosed |
| JP-56138127-A | — | — | None | — | — | JP | disclosed |
| JP-56090026-A | — | — | None | — | — | JP | disclosed |
| CN-117882008-A | Positive photosensitive resin composition | 日保丽公司 | 2024-04-12 | — | — | CN | disclosed |
| EP-3385791-B1 | PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, LAMINATE FILM, AND UPPER LAYER FILM FORMATION COMPOSITION | FUJIFILM CORP (JP) | 2024-02-28 | — | — | EP | disclosed |
| WO-2024009732-A1 | POSITIVE-ACTING PHOTOSENSITIVE RESIN COMPOSITION | 日本ポリテック株式会社 | 2024-01-11 | — | — | WO | disclosed |
| US-4960947-A | Process for producing hexafluoroacetone or its hydrate | NIPPON MEKTRON LIMITED (JP) | 1990-10-02 | — | — | US | disclosed |
| US-4766238-A | Fluorine-containing compounds, and their preparation and use | DAIKIN INDUSTRIES, LTD. (JP) | 1988-08-23 | — | — | US | disclosed |
| US-4739123-A | Fluorine-containing compounds, and their preparation and use | DAIKEN INDUSTRIES, LTD. (JP) | 1988-04-19 | — | — | US | disclosed |
| JP-S61126074-A | NOVEL PYRIMIDINE DERIVATIVE AND PRODUCTION THEREOF | NIPPON MEKTRON LTD | 1986-06-13 | — | — | JP | disclosed |
| JP-S61126068-A | NOVEL ISOTHIOUREA DERIVATIVE AND PRODUCTION THEREOF | NIPPON MEKTRON LTD | 1986-06-13 | — | — | JP | disclosed |
| JP-S60184062-A | NOVEL ISOTHIOUREA DERIVATIVE AND PREPARATION THEREOF | NIPPON MEKTRON LTD | 1985-09-19 | — | — | JP | disclosed |
| JP-S59196872-A | NOVEL PYRIMIDINE DERIVATIVE AND ITS PREPARATION | NIPPON MEKTRON LTD | 1984-11-08 | — | — | JP | disclosed |
| JP-S56138127-A | PREPARATION OF HEXAFLUOROISOBUTENE | DAIKIN IND LTD | 1981-10-28 | — | — | JP | disclosed |
| JP-S5690026-A | PREPARATION OF HEXAFLUOROISOBUTENE | DAIKIN IND LTD | 1981-07-21 | — | — | JP | disclosed |