Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GABRA1 | P14867 | 6/20 | 0.56 |
| ▸ | GABRB2 | P47870 | 6/20 | 0.56 |
| ▸ | POLB | P06746 | 2/20 | 0.49 |
| ▸ | MEN1 | O00255 | 2/20 | 0.45 |
| ▸ | GAA | P10253 | 2/20 | 0.45 |
| ▸ | MAPT | P10636 | 2/20 | 0.45 |
| ▸ | CNR1 | P21554 | 2/20 | 0.45 |
| ▸ | CNR2 | P34972 | 2/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.45 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.45 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.45 |
| ▸ | RXRA | P19793 | 1/20 | 0.45 |
| ▸ | GABRA5 | P31644 | 1/20 | 0.45 |
| ▸ | GABRA3 | P34903 | 1/20 | 0.45 |
| ▸ | GABRA2 | P47869 | 1/20 | 0.45 |
| ▸ | ACE2 | Q9BYF1 | 1/20 | 0.45 |
| ▸ | SIRT3 | Q9NTG7 | 1/20 | 0.45 |
| ▸ | AKR1B1 | P15121 | 2/20 | 0.44 |
| ▸ | ESR1 | P03372 | 3/20 | 0.41 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29414940 | 1.00 | GABRA1 (0.56) | GABRA1GABRB2POLBMEN1GAA | |
| SCHEMBL29463283 | 1.00 | GABRA1 (0.56) | GABRA1GABRB2POLBMEN1GAA | |
| SCHEMBL2300766 | 0.94 | ESR1 (0.53) | GABRA1GABRB2POLBMEN1GAA | |
| 2-Allylphenol SCHEMBL22207670 | 0.93 | GABRA1 (0.49) | GABRA1GABRB2POLBMEN1GAA | |
| SCHEMBL1400362 | 0.86 | GABRA1 (0.59) | GABRA1GABRB2POLBMEN1GAA | |
| SCHEMBL7608902 | 0.84 | ESR1 (0.36) | GABRA1GABRB2POLBESR1ESR2 | |
| Formic Acid SCHEMBL15743052 | 0.84 | GABRA1 (0.53) | GABRA1GABRB2POLBMEN1GAA | |
| SCHEMBL28417627 | 0.84 | GABRA1 (0.53) | GABRA1GABRB2POLBMEN1GAA | |
| SCHEMBL10039388 | 0.83 | GABRA1 (0.36) | GABRA1GABRB2POLBGAAALOX5 | |
| SCHEMBL14626464 | 0.83 | GABRA1 (0.40) | GABRA1GABRB2POLBMEN1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 93 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6991887-B1 | Photopatternable sorbent and functionalized films | BATTELLE MEMORIAL INSTITUTE (US) | 2006-01-31 | — | — | US | claimed |
| US-6015869-A | SORBENT COPOLYMERS(OR OLIGOMERS) CONTAINING ALKYL-SUBSTITUTED FLUORINATED BISPHENOL MONOMERS ALTERNATING WITH SILOXANE MONOMERS, FOR SENSITIVE THIN FILMS ON SENSORS OR CLADDING ON OPTICAL FIBERS | BATTELLE MEMORIAL INSTITUTE (US) | 2000-01-18 | — | — | US | claimed |
| EP-0372775-B1 | Thermosetting-resin-forming compositions | MITSUI TOATSU CHEMICALS (JP) | 1994-05-18 | — | — | EP | claimed |
| US-4968762-A | IMPACT STRENGTH, TOUGHNESS, LOW WATER ABSORPTION | MITSUI TOATSU CHEMICALS, INC. (JP) | 1990-11-06 | — | — | US | claimed |
| EP-0372775-A1 | Thermosetting-resin-forming compositions | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1990-06-13 | — | — | EP | claimed |
| US-20240369930-A1 | COMPOSITION FOR SPIN-ON CARBON FILM FORMATION, METHOD FOR PRODUCING COMPOSITION FOR SPIN-ON CARBON FILM FORMATION, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-11-07 | — | — | US | disclosed |
| WO-2024107818-A1 | BIS-TRIFLUOROMETHYL HONOKIOL ANALOGS AND THEIR USE IN TREATING CARDIOVASCULAR DISORDERS | VANDERBILT UNIVERSITY (US) | 2024-05-23 | — | — | WO | disclosed |
| US-20240117101-A1 | COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING AMORPHOUS FILM, RESIST PATTERN FORMATION METHOD, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, COMPOSITION FOR OPTICAL MEMBER FORMATION, RESIN FOR UNDERLAYER FILM FORMATION, RESIST RESIN, RADIATION-SENSITIVE RESIN, AND RESIN FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-04-11 | — | — | US | disclosed |
| US-20230314942-A1 | POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION, METHOD FOR PRODUCING POLYCYCLIC POLYPHENOLIC RESIN, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230296982-A1 | POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, RESIST PATTERN FORMATION METHOD, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-09-21 | — | — | US | disclosed |
| WO-2023032998-A1 | SPIN-ON-CARBON FILM-FORMING COMPOSITION, METHOD FOR PRODUCING SPIN-ON-CARBON FILM-FORMING COMPOSITION, LITHOGRAPHIC UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING CIRCUIT PATTERN | 三菱瓦斯化学株式会社 | 2023-03-09 | — | — | WO | disclosed |
| WO-2022267730-A1 | METHOD FOR SYNTHESIZING MOLECULAR GLASS, AND USE THEREOF AS HIGH-FREQUENCY LOW-DIELECTRIC-CONSTANT MATERIAL | 中国科学院上海有机化学研究所 | 2022-12-29 | — | — | WO | disclosed |
| US-7157052-B1 | Linear chemoselective carbosilane polymers and methods for use in analytical and purification applications | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) | 2007-01-02 | — | — | US | disclosed |
| US-6991887-B1 | Photopatternable sorbent and functionalized films | BATTELLE MEMORIAL INSTITUTE (US) | 2006-01-31 | — | — | US | disclosed |
| US-6602551-B2 | Addition-condensation copolymer | GENERAL ELECTRIC COMPANY | 2003-08-05 | — | — | US | disclosed |
| US-20030049465-A1 | Curable silicone adhesive compositions | GENERAL ELECTRIC COMPANY | 2003-03-13 | — | — | US | disclosed |
| US-6015869-A | SORBENT COPOLYMERS(OR OLIGOMERS) CONTAINING ALKYL-SUBSTITUTED FLUORINATED BISPHENOL MONOMERS ALTERNATING WITH SILOXANE MONOMERS, FOR SENSITIVE THIN FILMS ON SENSORS OR CLADDING ON OPTICAL FIBERS | BATTELLE MEMORIAL INSTITUTE (US) | 2000-01-18 | — | — | US | disclosed |
| EP-0372775-B1 | Thermosetting-resin-forming compositions | MITSUI TOATSU CHEMICALS (JP) | 1994-05-18 | — | — | EP | disclosed |
| US-4968762-A | IMPACT STRENGTH, TOUGHNESS, LOW WATER ABSORPTION | MITSUI TOATSU CHEMICALS, INC. (JP) | 1990-11-06 | — | — | US | disclosed |
| EP-0372775-A1 | Thermosetting-resin-forming compositions | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1990-06-13 | — | — | EP | disclosed |