Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 2/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | PKM | P14618 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | CNR2 | P34972 | 3/20 | 0.38 |
| ▸ | CNR1 | P21554 | 2/20 | 0.36 |
| ▸ | PREP | P48147 | 1/20 | 0.36 |
| ▸ | ABL1 | P00519 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | RIN1 | Q13671 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4102876 | 0.86 | HSD11B1 (0.47) | HSD11B1ALDH1A1PKML3MBTL1CNR2 | |
| SCHEMBL2026422 | 0.81 | GLA (0.44) | HSD11B1ALDH1A1L3MBTL1KDM4ETHRB | |
| SCHEMBL906383 | 0.81 | GLA (0.44) | HSD11B1ALDH1A1L3MBTL1KDM4ETHRB | |
| SCHEMBL5346781 | 0.80 | HSD11B1 (0.54) | HSD11B1ALDH1A1PKMCNR2CNR1 | |
| SCHEMBL14455208 | 0.78 | HSD11B1 (0.53) | HSD11B1ALDH1A1PKML3MBTL1CNR2 | |
| SCHEMBL159741 | 0.78 | HSD11B1 (0.53) | HSD11B1ALDH1A1PKML3MBTL1CNR2 | |
| SCHEMBL17636389 | 0.78 | HSD11B1 (0.53) | HSD11B1ALDH1A1PKML3MBTL1CNR2 | |
| SCHEMBL5609803 | 0.78 | HSD11B1 (0.46) | HSD11B1ALDH1A1PKML3MBTL1CNR2 | |
| SCHEMBL28845132 | 0.77 | HSD11B1 (0.56) | HSD11B1ALDH1A1PKML3MBTL1CNR2 | |
| SCHEMBL16593600 | 0.77 | HSD11B1 (0.56) | HSD11B1ALDH1A1PKML3MBTL1CNR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7135268-B2 | Using aromatic sulfonate compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-11-14 | — | — | US | claimed |
| US-6951706-B2 | Sulfonate and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-10-04 | — | — | US | claimed |
| US-20050100819-A1 | Chemical amplification type positive resist composition and a resin therefor | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-05-12 | — | — | US | claimed |
| US-20050014095-A1 | Sulfonate and a resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-01-20 | — | — | US | claimed |
| US-20040152009-A1 | Sulfonate and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2004-08-05 | — | — | US | claimed |
| US-11840597-B2 | Curable resin composition and cured product thereof | CANON KABUSHIKI KAISHA (JP) | 2023-12-12 | — | — | US | disclosed |
| US-20210230341-A1 | CURABLE RESIN COMPOSITION AND CURED PRODUCT THEREOF | CANON KABUSHIKI KAISHA (JP) | 2021-07-29 | — | — | US | disclosed |
| US-10766992-B2 | Resin and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-09-08 | — | — | US | disclosed |
| EP-1708027-B1 | UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORP (JP) | 2019-03-13 | — | — | EP | disclosed |
| US-9994685-B2 | Resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-06-12 | — | — | US | disclosed |
| US-20150132698-A1 | RESIN AND RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-05-14 | — | — | US | disclosed |
| US-9029467-B2 | Resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-05-12 | — | — | US | disclosed |
| US-6951706-B2 | Sulfonate and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-10-04 | — | — | US | disclosed |
| CN-1210623-C | Chemical amplifying type positive photoetching rubber composition | SUMITOMO CHEMICAL CO (JP) | 2005-07-13 | — | — | CN | disclosed |
| US-20050100819-A1 | Chemical amplification type positive resist composition and a resin therefor | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-05-12 | — | — | US | disclosed |
| US-20050100819-A1 | Chemical amplification type positive resist composition and a resin therefor | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-05-12 | — | — | US | disclosed |
| CN-1603957-A | Chemical amplification type positive resist composition and a resin therefor | SUMITOMO CHEMICAL CO (JP) | 2005-04-06 | — | — | CN | disclosed |
| US-20050014095-A1 | Sulfonate and a resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-01-20 | — | — | US | disclosed |
| US-20040152009-A1 | Sulfonate and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2004-08-05 | — | — | US | disclosed |
| CN-1316675-A | Chemical amplifying type positive photoetching rubber composition | SUMITOMO CHEMICAL CO (JP) | 2001-10-10 | — | — | CN | disclosed |