Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GLA | P06280 | 1/20 | 0.44 |
| ▸ | HSD11B1 | P28845 | 4/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 2/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.38 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | CRHBP | P24387 | 1/20 | 0.36 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.36 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL906383 | 1.00 | GLA (0.44) | GLAHSD11B1L3MBTL1HTTKDM4E | |
| SCHEMBL524018 | 0.83 | GLA (0.44) | GLAHSD11B1L3MBTL1HTTKDM4E | |
| SCHEMBL1218819 | 0.83 | GLA (0.44) | GLAHSD11B1L3MBTL1HTTKDM4E | |
| SCHEMBL524017 | 0.83 | GLA (0.44) | GLAHSD11B1L3MBTL1HTTKDM4E | |
| SCHEMBL1055413 | 0.81 | HSD11B1 (0.47) | HSD11B1L3MBTL1KDM4EALDH1A1THRB | |
| SCHEMBL14777571 | 0.76 | CA2 (0.44) | GLAHSD11B1L3MBTL1ALDH1A1EPHX1 | |
| SCHEMBL3207184 | 0.76 | HSD11B1 (0.40) | GLAHSD11B1L3MBTL1HTTKDM4E | |
| SCHEMBL3207190 | 0.76 | HSD11B1 (0.40) | GLAHSD11B1L3MBTL1HTTKDM4E | |
| SCHEMBL14777575 | 0.76 | CA2 (0.44) | GLAHSD11B1L3MBTL1ALDH1A1EPHX1 | |
| SCHEMBL595456 | 0.76 | HSD11B1 (0.40) | GLAHSD11B1HTTKDM4EALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10670965-B2 | Polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-06-02 | — | — | US | claimed |
| US-9983477-B2 | Polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-05-29 | — | — | US | claimed |
| EP-2527380-B1 | Photosensitive compositions | ROHM & HAAS ELECT MAT (US) | 2013-12-18 | — | — | EP | claimed |
| US-8507176-B2 | Photosensitive compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2013-08-13 | — | — | US | claimed |
| EP-2341089-B1 | Photosensitive compositions | ROHM & HAAS ELECT MAT (US) | 2013-02-13 | — | — | EP | claimed |
| US-20110236823-A1 | NOVEL POLYMERS AND PHOTORESIST COMPOSITIONS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-09-29 | — | — | US | claimed |
| EP-2341089-A1 | Photosensitive compositions | Rohm and Haas Electronic Materials LLC (US) | 2011-07-06 | — | — | EP | claimed |
| US-20110159429-A1 | PHOTOSENSITIVE COMPOSITIONS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-06-30 | — | — | US | claimed |
| US-7838199-B2 | Polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-11-23 | — | — | US | claimed |
| US-20080206671-A1 | Novel polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-08-28 | — | — | US | claimed |
| US-10670965-B2 | Polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-06-02 | — | — | US | disclosed |
| EP-2597518-B1 | Compositions and antireflective coatings for photolithography | DOW GLOBAL TECHNOLOGIES LLC (US) | 2016-12-07 | — | — | EP | disclosed |
| US-9011591-B2 | Compositions and antireflective coatings for photolithography | DOW GLOBAL TECHNOLOGIES LLC (US) | 2015-04-21 | — | — | US | disclosed |
| US-8557501-B2 | Developable bottom antireflective coating compositions especially suitable for ion implant applications | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-10-15 | — | — | US | disclosed |
| US-8507176-B2 | Photosensitive compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2013-08-13 | — | — | US | disclosed |
| US-7781144-B2 | Positive resist composition and resist pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-08-24 | — | — | US | disclosed |
| US-20100196825-A1 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-08-05 | — | — | US | disclosed |
| WO-2010086288-A1 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS AND METHOD OF FORMING A PATTERN USING IT | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-08-05 | — | — | WO | disclosed |
| US-20090098483-A1 | POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHA KOGYO CO., LTD. (JP) | 2009-04-16 | — | — | US | disclosed |
| US-20090035698-A1 | POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-02-05 | — | — | US | disclosed |