SCHEMBL10587799

SCHEMBL10587799

O=C1c2ccccc2C(=O)c2c1ccc1c2C1c1ccccc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADORA2A P29274 3/20 0.50
MAOA P21397 3/20 0.47
MAOB P27338 1/20 0.47
ALDH1A1 P00352 8/20 0.46
L3MBTL1 Q9Y468 6/20 0.46
MAPK1 P28482 8/20 0.46
MAPT P10636 7/20 0.46
LMNA P02545 4/20 0.46
CYP3A4 P08684 3/20 0.46
TP53 P04637 1/20 0.46
CYP1A2 P05177 1/20 0.46
HTR2B P41595 1/20 0.46
MEN1 O00255 4/20 0.45
KMT2A Q03164 4/20 0.45
POLB P06746 2/20 0.45
THRB P10828 2/20 0.45
RECQL P46063 2/20 0.45
SMN1; SMN2 Q16637 5/20 0.45
TDP1 Q9NUW8 3/20 0.45
RAB9A P51151 3/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25028023 0.72 LMNA (0.54) ADORA2AMAOAALDH1A1L3MBTL1MAPK1
SCHEMBL3135177 0.71 CYP1A2 (0.58) ALDH1A1MAPK1MAPTLMNACYP3A4
SCHEMBL6904744 0.71 ADORA2A (0.41) ADORA2AALDH1A1L3MBTL1MAPK1MAPT
SCHEMBL5010110 0.70 MEN1 (0.67) ADORA2AMAOAMAOBALDH1A1L3MBTL1
SCHEMBL29836726 0.70 MEN1 (0.67) ADORA2AMAOAMAOBALDH1A1L3MBTL1
SCHEMBL9335085 0.70 MEN1 (0.67) ADORA2AMAOAMAOBALDH1A1L3MBTL1
SCHEMBL224650 0.67 ALDH1A1 (0.66) ADORA2AMAOAMAOBALDH1A1L3MBTL1
SCHEMBL26348 0.67 ADORA2A (1.00) ADORA2AMAOAMAOBALDH1A1L3MBTL1
SCHEMBL1557667 0.67 ADORA2A (1.00) ADORA2AMAOAMAOBALDH1A1L3MBTL1
SCHEMBL30580334 0.67 ALDH1A1 (0.66) ADORA2AMAOAMAOBALDH1A1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4826752-A Dry photosensitive lithographic plate comprising a silicon rubber layer containing an aromatic aminosilane FUJI PHOTO FILM CO., LTD. (JP) 1989-05-02 US claimed
EP-0336400-A2 Developer for dry ps plates FUJI PHOTO FILM CO., LTD. (JP) 1989-10-11 EP disclosed
US-4826752-A Dry photosensitive lithographic plate comprising a silicon rubber layer containing an aromatic aminosilane FUJI PHOTO FILM CO., LTD. (JP) 1989-05-02 US disclosed
US-4769308-A Dry presensitized plate with photosensitive layer containing organotin FUJI PHOTO FILM CO., LTD. (JP) 1988-09-06 US disclosed
US-4743527-A LITHOGRAPHY FUJI PHOTO FILM CO., LTD. (JP) 1988-05-10 US disclosed
US-4301229-A Electrolytically grained aluminum support for making a lithographic plate and presensitized lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 1981-11-17 US disclosed
US-4116695-A TREATING AN ALUMINUM PLATE, WHICH HAS BEEN ANODIZED AND ETCHED, WITH HOT WATER OR WATER VAPOR FUJI PHOTO FILM CO., LTD. (JP) 1978-09-26 US disclosed