⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethylene Glycol SCHEMBL3267802 | 1.00 | — | — | |
| SCHEMBL44073 | 0.91 | — | — | |
| Ether SCHEMBL10884068 | 0.89 | ALDH1A1 (0.30) | — | |
| Hydrazine SCHEMBL22444473 | 0.86 | — | — | |
| SCHEMBL3049897 | 0.84 | — | — | |
| Toluene SCHEMBL3468312 | 0.83 | KDM4E (0.33) | — | |
| Diphenylmethane SCHEMBL3468648 | 0.82 | LMNA (0.36) | — | |
| SCHEMBL5668483 | 0.81 | — | — | |
| SCHEMBL6535623 | 0.81 | — | — | |
| SCHEMBL17743473 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115926172-B | High-toughness high-hardness photo-curing resin based on trapezoid polysilsesquioxane and preparation method thereof | 广州一新科技有限公司 | 2023-10-13 | — | — | CN | claimed |
| CN-115926172-A | High-toughness high-hardness light-cured resin based on trapezoidal polysilsesquioxane and preparation method thereof | 广州一新科技有限公司 | 2023-04-07 | — | — | CN | claimed |
| WO-2024128306-A1 | COMPOSITE POLYMER MATERIAL, METHOD FOR PRODUCING SAME, AND OPTICAL MATERIAL | 国立大学法人大阪大学 | 2024-06-20 | — | — | WO | disclosed |
| EP-4375312-A1 | SILICONE-BASED POLYMER COMPOUND AND SILICONE-BASED POLYMER MATERIAL | OSAKA UNIVERSITY (JP) | 2024-05-29 | — | — | EP | disclosed |
| CN-117693545-A | Organosilicon polymer compound and organosilicon polymer material | 国立大学法人大阪大学 | 2024-03-12 | — | — | CN | disclosed |
| CN-115926172-B | High-toughness high-hardness photo-curing resin based on trapezoid polysilsesquioxane and preparation method thereof | 广州一新科技有限公司 | 2023-10-13 | — | — | CN | disclosed |
| US-20230192931-A1 | HOST-GROUP-CONTAINING POLYMERIZABLE MONOMER, POLYMER MATERIAL, METHOD FOR PRODUCING SAME, AND CLATHRATE COMPOUND AND METHOD FOR PRODUCING SAME | OSAKA UNIVERSITY (JP) | 2023-06-22 | — | — | US | disclosed |
| CN-115926172-A | High-toughness high-hardness light-cured resin based on trapezoidal polysilsesquioxane and preparation method thereof | 广州一新科技有限公司 | 2023-04-07 | — | — | CN | disclosed |
| CN-111801355-B | Polymer material and method for producing same | 国立大学法人大阪大学 | 2023-02-28 | — | — | CN | disclosed |
| WO-2023003043-A1 | SILICONE-BASED POLYMER COMPOUND AND SILICONE-BASED POLYMER MATERIAL | 国立大学法人大阪大学 | 2023-01-26 | — | — | WO | disclosed |
| CN-110922518-B | Water-resistant intumescent flame retardant and preparation method and application thereof | 华东理工大学 | 2021-04-23 | — | — | CN | disclosed |
| CN-110922518-A | Water-resistant intumescent flame retardant and preparation method and application thereof | 华东理工大学 | 2020-03-27 | — | — | CN | disclosed |
| EP-3555203-A1 | DISULFIDE-CONTAINING SELF-HEALING POLYMER BLEND | Repsol, S.A. (ES) | 2019-10-23 | — | — | EP | disclosed |
| CN-108348885-A | The microcapsules and composition of the controlled release of active matter are provided | 诺赛尔股份有限公司 | 2018-07-31 | — | — | CN | disclosed |
| WO-2018108950-A1 | DISULFIDE-CONTAINING SELF-HEALING POLYMER BLEND | REPSOL, S.A. (ES) | 2018-06-21 | — | — | WO | disclosed |
| CN-107338661-A | Thermal sublimation printing ink for transfer printing | 纳米及先进材料研发院有限公司 | 2017-11-10 | — | — | CN | disclosed |
| CN-102690419-B | Silicon-containing prepolymer and silicone hydrogel biomaterial containing same | ZHAN QIANQING | 2014-05-07 | — | — | CN | disclosed |
| EP-0143552-B1 | COMPOSITE MEMBRANE AND PROCESS FOR THE PRODUCTION THEREOF | NITTO DENKO CORPORATION (JP) | 1989-09-06 | — | — | EP | disclosed |
| US-4618534-A | ANISOTROPIC POLYIMIDE RESIN COATED WITH THIN LAYER OF CROSSLINKED POLYSILOXANE | NITTO ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1986-10-21 | — | — | US | disclosed |
| EP-0143552-A2 | Composite membrane and process for the production thereof | NITTO DENKO CORPORATION (JP) | 1985-06-05 | — | — | EP | disclosed |