SCHEMBL1060723

SCHEMBL1060723

C=C[Si](C=C)(C=CC)O[Si](C)(C)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL335572 0.84
SCHEMBL8440192 0.81
SCHEMBL15302438 0.77
SCHEMBL3481321 0.75
SCHEMBL13621351 0.73
SCHEMBL13621362 0.73
SCHEMBL4851011 0.73
SCHEMBL3481575 0.70
SCHEMBL426324 0.69
SCHEMBL15216273 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9464172-B2 Alkali-developable curable composition, insulating thin film using the same, and thin film transistor KANEKA CORPORATION (JP) 2016-10-11 US disclosed
US-8809414-B2 Photocurable composition and cured product KANEKA CORPORATION (JP) 2014-08-19 US disclosed
EP-2236543-B1 POLYSILOXANE COMPOUND, ALKALI-DEVELOPABLE CURABLE COMPOSITION, INSULATING THIN FILM USING THE SAME, AND THIN FILM TRANSISTOR KANEKA CORP (JP) 2014-02-26 EP disclosed
US-20110237702-A1 PHOTOCURABLE COMPOSITION AND CURED PRODUCT KANEKA CORPORATION (JP) 2011-09-29 US disclosed
EP-2343326-A1 PHOTOCURABLE COMPOSITION AND CURED PRODUCT Kaneka Corporation (JP) 2011-07-13 EP disclosed
US-20110001190-A1 ALKALI-DEVELOPABLE CURABLE COMPOSITION, INSULATING THIN FILM USING THE SAME, AND THIN FILM TRANSISTOR KANEKA CORPORATION (JP) 2011-01-06 US disclosed
EP-2236543-A1 ALKALI-DEVELOPABLE CURABLE COMPOSITION, INSULATING THIN FILM USING THE SAME, AND THIN FILM TRANSISTOR Kaneka Corporation (JP) 2010-10-06 EP disclosed