SCHEMBL335572

SCHEMBL335572

C=C[Si](C=C)(C=C)O[Si](C)(C)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8440192 0.97
SCHEMBL3481321 0.91
SCHEMBL13621362 0.88
SCHEMBL13621351 0.88
SCHEMBL4851011 0.87
SCHEMBL3481575 0.85
SCHEMBL1060723 0.84
SCHEMBL426324 0.78
SCHEMBL15216273 0.78
SCHEMBL1924718 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 122 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2135119-B1 DIELECTRIC AND HYDROPHOBIC COATINGS FOR VARIABLE FOCAL LENGTH LENS PARROT (FR) 2016-07-06 EP claimed
US-7791815-B2 Dielectric coatings for electrowetting applications VARIOPTIC S.A. (FR) 2010-09-07 US claimed
EP-2135119-A1 DIELECTRIC AND HYDROPHOBIC COATINGS FOR ELECTROWETTING APPLICATIONS Varioptic (FR) 2009-12-23 EP claimed
US-20080225378-A1 DIELECTRIC COATINGS FOR ELECTROWETTING APPLICATIONS VARIOPTIC 2008-09-18 US claimed
WO-2008110560-A1 DIELECTRIC AND HYDROPHOBIC COATINGS FOR ELECTROWETTING APPLICATIONS VARIOPTIC (FR) 2008-09-18 WO claimed
US-20060079099-A1 Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2006-04-13 US claimed
EP-0150403-B1 MULTILEVEL METAL STRUCTURE AND PROCESS FOR MAKING SAME International Business Machines Corporation (US) 1988-08-03 EP claimed
EP-4568717-A1 PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION REACTORS AND ASSOCIATED METHODS Kayaku Advanced Materials, Inc. (US) 2025-06-18 EP disclosed
US-20240282546-A1 PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION REACTORS AND ASSOCIATED METHODS KAYAKU ADVANCED MATERIALS, INC. 2024-08-22 US disclosed
WO-2024168346-A1 PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION REACTORS AND ASSOCIATED METHODS KAYAKU ADVANCED MATERIALS, INC. (US) 2024-08-15 WO disclosed
US-11679412-B2 Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles GVD CORPORATION (US) 2023-06-20 US disclosed
US-20220388032-A1 METHODS FOR PLASMA DEPOSITING POLYMERS COMPRISING CYCLIC SILOXANES AND RELATED COMPOSITIONS AND ARTICLES GVD CORPORATION 2022-12-08 US disclosed
US-11393679-B2 Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles GVD CORPORATION (US) 2022-07-19 US disclosed
US-5224441-A APPARATUS FOR RAPID PLASMA TREATMENTS AND METHOD THE BOC GROUP, INC. (US) 1993-07-06 US disclosed
EP-0535810-A1 Blood collection tube assembly Becton, Dickinson and Company (US) 1993-04-07 EP disclosed
WO-1993006258-A1 APPARATUS FOR RAPID PLASMA TREATMENTS AND METHOD THE BOC GROUP, INC. (US) 1993-04-01 WO disclosed
EP-0503820-A1 Plasma enhanced chemical vapour deposition device THE BOC GROUP, INC. (US) 1992-09-16 EP disclosed
EP-0469926-A1 Silicon oxide based thin film vapour barriers THE BOC GROUP, INC. (US) 1992-02-05 EP disclosed
EP-0299754-A2 Method of plasma enhanced silicon oxide deposition The BOC Group, Inc. (US) 1989-01-18 EP disclosed
EP-0114229-A2 Method of forming a lift-off mask with improved oxygen barrier layer International Business Machines Corporation (US) 1984-08-01 EP disclosed