Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 3/20 | 0.36 |
| ▸ | CA12 | O43570 | 2/20 | 0.36 |
| ▸ | CA7 | P43166 | 2/20 | 0.36 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.36 |
| ▸ | LOXL2 | Q9Y4K0 | 3/20 | 0.33 |
| ▸ | CA2 | P00918 | 2/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | LOX | P28300 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | GMNN | O75496 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | BLM | P54132 | 1/20 | 0.32 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | CA9 | Q16790 | 1/20 | 0.32 |
| ▸ | SHBG | P04278 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21396988 | 0.85 | CA12 (0.31) | CA1CA12CA7CA14LOXL2 | |
| SCHEMBL4814240 | 0.83 | MMP1 (0.32) | CA1CA12CA7CA14SHBG | |
| SCHEMBL2951024 | 0.81 | CA1 (0.32) | CA1CA12CA7CA14LOXL2 | |
| SCHEMBL7894665 | 0.81 | CA2 (0.33) | CA2 | |
| SCHEMBL778401 | 0.80 | MMP1 (0.35) | CA1CA12CA7CA14LOXL2 | |
| SCHEMBL5662340 | 0.78 | CA1 (0.33) | CA1CA12CA7CA14LOXL2 | |
| SCHEMBL777574 | 0.78 | CA1 (0.33) | CA1CA12CA7CA14LOXL2 | |
| SCHEMBL14454083 | 0.78 | CA1 (0.33) | CA1CA12CA7CA14LOXL2 | |
| SCHEMBL776888 | 0.77 | MMP1 (0.33) | CA1CA12CA7CA14EPHX1 | |
| SCHEMBL10654218 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 82 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6479210-B2 | COMPRISING AN ORGANIC MATERIAL CONTAINING SUBSTITUENT(S) CAPABLE OF BEING RELEASED IN THE PRESENCE OF ACID, AND ACID GENERATORS OF AT LEAST ONE ONIUM SALT AND SULFONE AND/OR SULFONATE COMPOUNDS; RESOLUTION, SENSITIVITY | CLARIANT FINANCE (BVI) LIMITED (VG) | 2002-11-12 | — | — | US | claimed |
| US-20250352110-A1 | BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR PRODUCING BIO-ELECTRODE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-20 | — | — | US | disclosed |
| EP-4651157-A1 | BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR PRODUCING BIO-ELECTRODE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-19 | — | — | EP | disclosed |
| US-20240206322-A1 | OPTICAL SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME, SOLID-STATE IMAGING DEVICE, AND ELECTRONIC DEVICE | KANEKA CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| US-20230408923-A1 | SUBSTRATE LAMINATE, IMAGE SENSOR, AND METHOD FOR MANUFACTURING SUBSTRATE LAMINATE | KANEKA CORPORATION (JP) | 2023-12-21 | — | — | US | disclosed |
| CN-117121184-A | Optical semiconductor device, method for manufacturing the same, solid-state imaging device, and electronic apparatus | 株式会社钟化 | 2023-11-24 | — | — | CN | disclosed |
| CN-117083706-A | Substrate laminate, image sensor, and method for manufacturing substrate laminate | 株式会社钟化 | 2023-11-17 | — | — | CN | disclosed |
| CN-110963952-B | Onium salt, resist composition and pattern forming method | 信越化学工业株式会社 | 2022-10-21 | — | — | CN | disclosed |
| CN-115185156-A | Photosensitive resin composition for forming partition wall, organic electroluminescent element, image display device, and illumination | 三菱化学株式会社 | 2022-10-14 | — | — | CN | disclosed |
| CN-109661855-B | Photosensitive resin composition for forming organic electroluminescent element spacer, organic electroluminescent element, image display device, and lighting | 三菱化学株式会社 | 2022-07-08 | — | — | CN | disclosed |
| US-5468589-A | Heat resistant, photosensitive patterns | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1995-11-21 | — | — | US | disclosed |
| EP-0675410-A1 | Resist composition for deep ultraviolet light | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1995-10-04 | — | — | EP | disclosed |
| US-5389491-A | Negative working resist composition | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1995-02-14 | — | — | US | disclosed |
| US-5350660-A | Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1994-09-27 | — | — | US | disclosed |
| EP-0440375-B1 | Diazodisulfones | WAKO PURE CHEM IND LTD (JP) | 1994-07-13 | — | — | EP | disclosed |
| EP-0579420-A2 | Negative working resist material and pattern forming process | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1994-01-19 | — | — | EP | disclosed |
| US-5216135-A | Photosensitive material which generates an acid by irradiation ; high transmittance, solution stability in photoresists and dissolution inhibiting of photoresists in alkali developers | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1993-06-01 | — | — | US | disclosed |
| EP-0520642-A1 | Resist material and pattern formation process | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1992-12-30 | — | — | EP | disclosed |
| EP-0440374-A2 | Chemical amplified resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1991-08-07 | — | — | EP | disclosed |
| EP-0440375-A1 | Diazodisulfones | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1991-08-07 | — | — | EP | disclosed |