SCHEMBL1063405

SCHEMBL1063405

Cc1ccc(-c2nc(C(Cl)(Cl)Cl)nc(C(Cl)(Cl)Cl)n2)c(Br)c1

nearest known ligand 0.41

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.32
MAPK1 P28482 2/20 0.32
NPC1 O15118 4/20 0.31
RAB9A P51151 4/20 0.31
L3MBTL1 Q9Y468 2/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
NFKB1 P19838 2/20 0.31
NFKB2 Q00653 2/20 0.31
RELA Q04206 2/20 0.31
LMNA P02545 1/20 0.31
TP53 P04637 1/20 0.31
HPGD P15428 1/20 0.31
TSHR P16473 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
CYP1A2 P05177 1/20 0.30
CYP2A6 P11509 1/20 0.30
GAA P10253 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30609978 1.00 MAPT (0.32) MAPTMAPK1NPC1RAB9AL3MBTL1
SCHEMBL498765 0.81 NPC1 (0.42) MAPTNPC1RAB9AL3MBTL1SMN1; SMN2
SCHEMBL27979985 0.80 MAPK1 (0.32) MAPTMAPK1NPC1RAB9AL3MBTL1
SCHEMBL4579356 0.76
SCHEMBL392164 0.72 EGFR (0.33)
SCHEMBL391557 0.72 EGFR (0.33)
SCHEMBL4535410 0.72 F2R (0.44) MAPTMAPK1NPC1RAB9ASMN1; SMN2
SCHEMBL946487 0.72 LMNA (0.35) MAPTLMNATSHR
SCHEMBL24434164 0.71 ALDH1A1 (0.43) MAPK1NPC1RAB9AL3MBTL1SMN1; SMN2
SCHEMBL30185791 0.71 ALDH1A1 (0.43) MAPK1NPC1RAB9AL3MBTL1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240206322-A1 OPTICAL SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME, SOLID-STATE IMAGING DEVICE, AND ELECTRONIC DEVICE KANEKA CORPORATION (JP) 2024-06-20 US disclosed
WO-2022210798-A1 OPTICAL SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME, SOLID-STATE IMAGING DEVICE, AND ELECTRONIC APPARATUS 株式会社カネカ 2022-10-06 WO disclosed
US-10690825-B2 Color filter for low temperature applications BASF SE (DE) 2020-06-23 US disclosed
EP-1999514-B1 PHOTOSENSITIVE RESIST COMPOSITION FOR COLOR FILTERS FOR USE IN ELECTRONIC PAPER DISPLAY DEVICES CIBA HOLDING INC (CH) 2018-10-03 EP disclosed
US-20170131447-A1 COLOR FILTER FOR LOW TEMPERATURE APPLICATIONS BASF SE (DE) 2017-05-11 US disclosed
US-9575230-B2 Color filter for low temperature applications BASF SE (DE) 2017-02-21 US disclosed
EP-2567285-B1 COLOR FILTER FOR LOW TEMPERATURE APPLICATIONS BASF SE (DE) 2016-11-16 EP disclosed
US-9464172-B2 Alkali-developable curable composition, insulating thin film using the same, and thin film transistor KANEKA CORPORATION (JP) 2016-10-11 US disclosed
EP-2567284-B1 COLOR FILTER FOR LOW TEMPERATURE APPLICATIONS BASF SE (DE) 2016-08-31 EP disclosed
US-8993202-B2 Color filter for low temperature applications BASF SE (GB) 2015-03-31 US disclosed
US-6368774-B1 MIXTURE CONTAINING ISOINDOLININE DYE JSR CORPORATION (JP) 2002-04-09 US disclosed
US-6348298-B1 COMPOSITION CONSISTING OF COLORANT CONTAINING PHTHALOCYANINE BLUE AND PHTHALOCYANINE GREEN OR PIGMENT GREEN 36, ALKALI-SOLUBLE RESIN, POLYFUNCTIONAL MONOMER, AND PHOTOPOLYMERIZATION INITIATOR JSR CORPORATION (JP) 2002-02-19 US disclosed
US-6255034-B1 (A) A COLORANT, (B) A BINDER POLYMER, (C) A POLYFUNCTIONAL MONOMER AND (D) AN UNSATURATED AMIDE GROUP-CONTAINING MONOMER OR AN UNSATURATED MONOMER HAVING A CYCLIC AMIDE OR IMIDE GROUP, AND (E) A PHOTOPOLYMERIZATION INITIATOR. JSR CORPORATION (JP) 2001-07-03 US disclosed
US-6140019-A Radiation sensitive composition JSR CORPORATION (JP) 2000-10-31 US disclosed
EP-1033625-A1 Radiation sensitive composition JSR Corporation (JP) 2000-09-06 EP disclosed
EP-1033626-A1 Radiation sensitive composition JSR Corporation (JP) 2000-09-06 EP disclosed
US-6013415-A Radiation sensitive composition JSR CORPORATION (JP) 2000-01-11 US disclosed
EP-0902327-A2 Radiation sensitive composition JSR Corporation (JP) 1999-03-17 EP disclosed
EP-0893737-A2 Radiation sensitive composition JSR Corporation (JP) 1999-01-27 EP disclosed
EP-0866367-A2 Radiation sensitive composition JSR Corporation (JP) 1998-09-23 EP disclosed