Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | ESR1 | P03372 | 1/20 | 0.33 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | PDCD1 | Q15116 | 1/20 | 0.31 |
| ▸ | CD274 | Q9NZQ7 | 1/20 | 0.31 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | MAOA | P21397 | 1/20 | 0.31 |
| ▸ | MAOB | P27338 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | CA4 | P22748 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL705119 | 0.98 | ESR1 (0.37) | TSHRALDH1A1L3MBTL1ESR1ESR2 | |
| SCHEMBL28390987 | 0.89 | TSHR (0.33) | TSHRALDH1A1L3MBTL1ESR1ESR2 | |
| SCHEMBL27743568 | 0.88 | ESR1 (0.53) | TSHRALDH1A1ESR1ESR2TDP1 | |
| SCHEMBL24442805 | 0.83 | NPSR1 (0.31) | TSHRNPSR1 | |
| SCHEMBL6338270 | 0.83 | HTT (0.33) | TSHRALDH1A1LMNA | |
| SCHEMBL9633947 | 0.81 | TSHR (0.34) | TSHRALDH1A1L3MBTL1ESR1ESR2 | |
| SCHEMBL62236 | 0.80 | SLC6A2 (0.31) | TAAR1 | |
| SCHEMBL62234 | 0.80 | TDP1 (0.33) | ALDH1A1TDP1 | |
| SCHEMBL705272 | 0.80 | ESR1 (0.38) | TSHRALDH1A1L3MBTL1ESR1ESR2 | |
| SCHEMBL106923 | 0.80 | TDP1 (0.37) | TSHRALDH1A1L3MBTL1ESR1ESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 650 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120040771-A | Hafnium hybridization carbon-rich polysiloxane flexible ablation material, preparation method and application thereof | 四川大学 | 2025-05-27 | — | — | CN | claimed |
| CN-109952351-B | Antifouling coating composition and coated article having antifouling coating film formed on surface thereof | 日东化成株式会社 | 2021-07-30 | — | — | CN | claimed |
| EP-2628744-B1 | Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process | SHINETSU CHEMICAL CO (JP) | 2016-11-30 | — | — | EP | claimed |
| EP-2628745-B1 | Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-03-25 | — | — | EP | claimed |
| US-8216649-B2 | Liquid crystal aligning agent, method of producing a liquid crystal alignment film and liquid crystal display device | JSR CORPORATION (JP) | 2012-07-10 | — | — | US | claimed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692941-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-20260035591-A1 | EPOXY RESIN COMPOSITION | SHINETSU CHEMICAL CO (JP) | 2026-02-05 | — | — | US | disclosed |
| EP-4686727-A1 | EPOXY RESIN COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-04 | — | — | EP | disclosed |
| EP-4660703-A2 | METAL-CONTAINING FILM PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250372377-A1 | METAL-CONTAINING FILM PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-12-04 | — | — | US | disclosed |
| US-5661219-A | AN ACRYLIC COPOLYMER HAVING CARBOXY GROUPS BLOCKED BY A VINYL ETHER, A REACTIVE POLYMER, E.G.HAVING EPOXY GROUPS, AND LEWIS ACID-COMPLEX CATALYST; HIGH SOLIDS; LOW TEMPERATURE CURING; STORAGE STABILITY; MECHANICAL PROPERTIES | NOF CORPORATION (JP) | 1997-08-26 | — | — | US | disclosed |
| EP-0643112-B1 | Curable composition, thermal latent acid catalyst, method of coating, coated article, method of molding and molded article | NOF CORP (JP) | 1997-07-30 | — | — | EP | disclosed |
| EP-0709415-A2 | Curable base-coat composition, method of film-forming and coated articles | NOF CORPORATION (JP) | 1996-05-01 | — | — | EP | disclosed |
| EP-0643112-A2 | Curable composition, thermal latent acid catalyst, method of coating, coated article, method of molding and molded article | NOF CORPORATION (JP) | 1995-03-15 | — | — | EP | disclosed |
| EP-0226208-B1 | INSULATING FILM FOR SEMICONDUCTOR, PRODUCTION OF THE SAME AND LIQUID COMPOSITION FOR PRODUCING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-11-21 | — | — | EP | disclosed |
| US-4865949-A | Optical information recording medium | RICOH COMPANY, LTD. (JP) | 1989-09-12 | — | — | US | disclosed |
| EP-0226208-A2 | Insulating film for semiconductor, production of the same and liquid composition for producing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1987-06-24 | — | — | EP | disclosed |
| US-4387196-A | DIELECTRICS | RAYCHEM LIMITED (GB) | 1983-06-07 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260035591-A1 | EPOXY RESIN COMPOSITION | ASH2L, PSMA1, SEM1 | TSHR 3424/4885ALDH1A1 641/4885L3MBTL1 1067/4885 |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | EFNA1, EPHA4, ETV6 | TSHR 770/4885ALDH1A1 4452/4885L3MBTL1 1596/4885 |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SMC1A, SPOUT1, LBR | TSHR 446/4885ALDH1A1 1558/4885L3MBTL1 282/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.