SCHEMBL106751

SCHEMBL106751

C[S+](c1ccccc1)c1ccccc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.39
ACHE P22303 2/20 0.39
LMNA P02545 1/20 0.39
ALOX12 P18054 1/20 0.39
ALDH1A1 P00352 2/20 0.35
DPP4 P27487 2/20 0.33
CA4 P22748 2/20 0.33
TP53 P04637 1/20 0.33
OPRM1 P35372 1/20 0.32
OPRK1 P41145 1/20 0.32
OPRL1 P41146 1/20 0.32
APOBEC3A P31941 1/20 0.32
APOBEC3G Q9HC16 1/20 0.32
CA1 P00915 2/20 0.32
CA2 P00918 2/20 0.32
CA9 Q16790 2/20 0.32
TDP1 Q9NUW8 2/20 0.32
CA12 O43570 1/20 0.32
GLA P06280 1/20 0.32
CA3 P07451 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Iodide SCHEMBL1043793 0.97 TSHR (0.37) TSHRACHELMNAALOX12ALDH1A1
Hydrochloric Acid SCHEMBL157811 0.97 TSHR (0.37) TSHRACHELMNAALOX12ALDH1A1
Bromide SCHEMBL4338303 0.97 TSHR (0.37) TSHRACHELMNAALOX12ALDH1A1
SCHEMBL8607841 0.97 TSHR (0.37) TSHRACHELMNAALOX12ALDH1A1
Fluoride Ion SCHEMBL29753699 0.97 TSHR (0.37) TSHRACHELMNAALOX12ALDH1A1
Fluoride Ion SCHEMBL8607838 0.94 TSHR (0.35) TSHRACHELMNAALOX12ALDH1A1
Fluoride SCHEMBL8607842 0.91 LMNA (0.33) TSHRACHELMNAALOX12ALDH1A1
SCHEMBL2475486 0.91 LMNA (0.33) TSHRACHELMNAALOX12ALDH1A1
Perchlorate SCHEMBL3857783 0.88 PTGS2 (0.32) TSHRACHELMNAALOX12TDP1
SCHEMBL283734 0.88 ALDH1A1 (0.35) TSHRACHELMNAALOX12ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2212 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118295209-A Photoresist composition containing two sulfonium salts and preparation method and application thereof 中国科学院化学研究所 2024-07-05 CN claimed
US-20220220244-A1 DARK-COLORED SYSTEM PHOTOPOLYMERIZED COMPOSITION JIANGNAN UNIVERSITY 2022-07-14 US claimed
EP-3536798-B1 BIO-ASSISTED PROCESS FOR CONVERSION OF CARBON-DIOXIDE TO FUEL PRECURSORS INDIAN OIL CORP LTD (IN) 2022-06-01 EP claimed
US-9845416-B1 Curable adhesive compositions for flexible substrates SAES GETTERS S.P.A. (IT) 2017-12-19 US claimed
US-20170349794-A1 CURABLE ADHESIVE COMPOSITIONS FOR FLEXIBLE SUBSTRATES SAES GETTERS S.P.A. (IT) 2017-12-07 US claimed
EP-3180381-B1 CURABLE ADHESIVE COMPOSITIONS FOR FLEXIBLE SUBSTRATES GETTERS SPA (IT) 2017-11-22 EP claimed
EP-3180381-A1 CURABLE ADHESIVE COMPOSITIONS FOR FLEXIBLE SUBSTRATES Saes Getters S.p.A. (IT) 2017-06-21 EP claimed
WO-2017067865-A1 CURABLE ADHESIVE COMPOSITIONS FOR FLEXIBLE SUBSTRATES SAES GETTERS S.P.A. (IT) 2017-04-27 WO claimed
EP-2469337-B1 Positive photosensitive resin composition, method for forming pattern, and electronic component HITACHI CHEM DUPONT MICROSYS (JP) 2014-01-22 EP claimed
EP-1710230-B1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHINETSU CHEMICAL CO (JP) 2013-08-14 EP claimed
US-7718528-B2 Photoactive adhesion promoter in a SLAM INTEL CORPORATION (US) 2010-05-18 US claimed
US-7611828-B2 Photoactive adhesion promoter MICRON TECHNOLOGY, INC. 2009-11-03 US claimed
US-20090076291-A1 To help reduce semiconductor procedure effects, such as undesired line edge roughness, insufficient lithographical resolution, and limited depth of focus problems associated with the removal of a photoresist layer MICRON TECHNOLOGY, INC. 2009-03-19 US claimed
US-7501230-B2 Photoactive adhesion promoter MICRON TECHNOLOGY, INC. 2009-03-10 US claimed
CN-101034260-A Photosensitive resin composition DONGJIN SEMICHEM CO LTD (KR) 2007-09-12 CN claimed
US-20070105383-A1 PHOTOACTIVE ADHESION PROMOTER IN A SLAM MEAGLEY ROBERT P 2007-05-10 US claimed
US-20060216634-A1 Photoactive adhesion promoter in a slam INTEL CORPORATION 2006-09-28 US claimed
US-20040086800-A1 To help reduce semiconductor procedure effects, such as undesired line edge roughness, insufficient lithographical resolution, and limited depth of focus problems associated with the removal of a photoresist layer MICRON TECHNOLOGY, INC. 2004-05-06 US claimed
US-6440634-B1 MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS SHIN-ETSU CHEMICAL CO., LTD (JP) 2002-08-27 US claimed
US-4225497-A ACID CATALYSTS FOR IMIDATION RHONE-POULENC INDUSTRIES (FR) 1980-09-30 US claimed