⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Biphenyl SCHEMBL9722114 | 0.77 | ALDH1A1 (0.41) | — | |
| SCHEMBL1900603 | 0.72 | — | — | |
| SCHEMBL705103 | 0.72 | — | — | |
| SCHEMBL1802993 | 0.72 | — | — | |
| SCHEMBL3482345 | 0.69 | — | — | |
| SCHEMBL837169 | 0.69 | — | — | |
| SCHEMBL9458370 | 0.69 | — | — | |
| SCHEMBL2316884 | 0.67 | — | — | |
| SCHEMBL1313555 | 0.67 | — | — | |
| SCHEMBL7924017 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 286 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12583222-B2 | Solvent compatible nozzle plate | BRADY WORLDWIDE, INC. (US) | 2026-03-24 | — | — | US | claimed |
| EP-4634324-A1 | AMPHIPHILIC ABRASIVE PARTICLES AND THEIR USE FOR CHEMICAL MECHANICAL PLANARIZATION | Versum Materials US, LLC (US) | 2025-10-22 | — | — | EP | claimed |
| CN-117866204-B | Silicon-containing surface modifier and etching-resistant agent underlayer film composition, and preparation method and application thereof | 福建泓光半导体材料有限公司 | 2024-12-13 | — | — | CN | claimed |
| WO-2024129435-A1 | AMPHIPHILIC ABRASIVE PARTICLES AND THEIR USE FOR CHEMICAL MECHANICAL PLANARIZATION | VERSUM MATERIALS US, LLC (US) | 2024-06-20 | — | — | WO | claimed |
| US-20240198675-A1 | SOLVENT COMPATIBLE NOZZLE PLATE | FUNAI ELECTRIC CO., LTD. (JP) | 2024-06-20 | — | — | US | claimed |
| US-11958292-B2 | Solvent compatible nozzle plate | FUNAI ELECTRIC CO., LTD. (JP) | 2024-04-16 | — | — | US | claimed |
| CN-117866204-A | Silicon-containing surface modifier and etching-resistant agent underlayer film composition, and preparation method and application thereof | 福建泓光半导体材料有限公司 | 2024-04-12 | — | — | CN | claimed |
| CN-117866205-A | Silicon-containing surface modifier and resist underlayer film composition, and preparation method and application thereof | 福建泓光半导体材料有限公司 | 2024-04-12 | — | — | CN | claimed |
| CN-115113480-A | Composite photoresist material, preparation method thereof and fluid ejection head | 船井电机株式会社 | 2022-09-27 | — | — | CN | claimed |
| US-20220297428-A1 | Solvent Compatible Nozzle Plate | FUNAI ELECTRIC CO., LTD. (JP) | 2022-09-22 | — | — | US | claimed |
| EP-4060406-A2 | COMPOSITE PHOTORESIST MATERIAL AND METHOD FOR MAKING THEREOF, AND FLUID EJECTION HEAD | Funai Electric Co., Ltd. (JP) | 2022-09-21 | — | — | EP | claimed |
| US-10599034-B2 | Method for manufacturing MEMS devices and nano devices with varying degrees of hydrophobicity and hydrophilicity in a composite photoimageable dry film | FUNAI ELECTRIC CO., LTD. (JP) | 2020-03-24 | — | — | US | claimed |
| EP-2628745-B1 | Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-03-25 | — | — | EP | claimed |
| US-20120071700-A1 | CATALYSTS FOR HYDROGENATION OF UNSATURATED HYDROCARBONS AND PREPARATIONS AND USES THEREOF | CHINA PETROLEUM & CHEMICAL CORPORATION (CN) | 2012-03-22 | — | — | US | claimed |
| WO-2010082710-A1 | METHOD FOR PREPARING A HIGHLY DURABLE REVERSE OSMOSIS MEMBRANE | UNIVERSITY-INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY (KR) | 2010-07-22 | — | — | WO | claimed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| US-12600130-B2 | Ejection head nozzle flooding control | BRADY WORLDWIDE, INC. (US) | 2026-04-14 | — | — | US | disclosed |
| US-4732814-A | MAGNETIC RECORDING MEDIA | TORAY INDUSTRIES, INC. (JP) | 1988-03-22 | — | — | US | disclosed |
| EP-0238663-A1 | POLYESTER FILM WITH SMOOTH AND HIGHLY ADHESIVE SURFACE AND METHOD OF MAKING SAME. | TORAY INDUSTRIES (JP) | 1987-09-30 | — | — | EP | disclosed |
| WO-1987002172-A1 | POLYESTER FILM WITH SMOOTH AND HIGHLY ADHESIVE SURFACE AND METHOD OF MAKING SAME | TORAY INDUSTRIES, INC. (JP) | 1987-04-09 | — | — | WO | disclosed |