SCHEMBL106970

SCHEMBL106970

CC1C(=O)N(C)C(=O)C1C

nearest known ligand 0.38

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ADRA2C P18825 1/20 0.35
GSK3A P49840 1/20 0.35
GSK3B P49841 1/20 0.35
MGLL Q99685 1/20 0.35
KMT2A Q03164 3/20 0.32
MEN1 O00255 2/20 0.32
PABPC1 P11940 1/20 0.32
LMNA P02545 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
BLM P54132 1/20 0.31
ALDH1A1 P00352 1/20 0.30
MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20278694 1.00 ADRA2C (0.35) ADRA2CGSK3AGSK3BMGLLKMT2A
SCHEMBL19770696 0.87 ADRA2C (0.32) ADRA2CGSK3AGSK3BMGLLKMT2A
SCHEMBL19711790 0.87 ADRA2C (0.32) ADRA2CGSK3AGSK3BMGLLKMT2A
SCHEMBL19091628 0.80
SCHEMBL2661119 0.80
SCHEMBL10311254 0.79
SCHEMBL15215616 0.76 ADRA2C (0.33) ADRA2CGSK3AGSK3BMGLL
SCHEMBL14493758 0.76
SCHEMBL20625906 0.76
SCHEMBL14140239 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 438 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240213479-A1 ELECTRODE COMPOSITION, ELECTRODE SHEET FOR ALL-SOLID STATE SECONDARY BATTERY, ALL-SOLID STATE SECONDARY BATTERY, AND MANUFACTURING METHODS FOR ELECTRODE COMPOSITION, ELECTRODE SHEET FOR ALL-SOLID STATE SECONDARY BATTERY, AND ALL-SOLID STATE SECONDARY BATTERY FUJIFILM CORPORATION (JP) 2024-06-27 US disclosed
US-12018131-B2 Polymerized in-situ hybrid solid ion-conductive compositions Blue Current, Inc. (US) 2024-06-25 US disclosed
US-12019369-B2 Coloring composition, color filter, pattern forming method, solid-stage imaging element, and image display device FUJIFILM CORPORATION (JP) 2024-06-25 US disclosed
WO-2024111229-A1 POROUS LOW DIELECTRIC POLYMER FILM 日東電工株式会社 2024-05-30 WO disclosed
WO-2024105957-A1 LAMINATE, AND METHOD FOR MANUFACTURING LAMINATE 日東電工株式会社 2024-05-23 WO disclosed
WO-2023238515-A1 COMPOSITION, LIQUID CRYSTAL POLYMER SHEET, LOW DIELECTRIC SUBSTRATE MATERIAL, AND WIRING CIRCUIT BOARD 日東電工株式会社 2023-12-14 WO disclosed
US-20230355787-A1 COMPOSITIONS AND METHODS FOR PREDICTING RESPONSE TO NAPI2B-TARGETED THERAPY MERSANA THERAPEUTICS, INC. 2023-11-09 US disclosed
US-11703758-B2 Photosensitive composition for EUV light, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2023-07-18 US disclosed
US-20230183424-A1 POLYAMIDE-IMIDE-BASED FILM, PREPARATION METHOD THEREOF, AND COVER WINDOW AND DISPLAY DEVICE COMPRISING THE SAME MICROWORKS SOLUTIONS CO., LTD. (KR) 2023-06-15 US disclosed
US-11581570-B2 Polyurethane hybrid solid ion-conductive compositions Blue Current, Inc. (US) 2023-02-14 US disclosed
US-20070178405-A1 Positive resist composition and method of pattern formation with the same FUJI PHOTO FILM CO., LTD. 2007-08-02 US disclosed
US-20070172769-A1 Pattern forming method FUJIFILM CORPORATION (JP) 2007-07-26 US disclosed
US-7232638-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-06-19 US disclosed
US-20070128555-A1 Novel ester compound, polymer, resist composition, and patterning process CENTRAL GLASS CO., LTD. 2007-06-07 US disclosed
US-7220520-B2 Photosensitive resin compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2007-05-22 US disclosed
US-7214465-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2007-05-08 US disclosed
US-20070099111-A1 Novel positive photosensitive polybenzoxazole precursor compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2007-05-03 US disclosed
US-20070065753-A1 Positive resist composition for immersion exposure and pattern forming method using the same FUJI PHOTO FILM CO., LTD. 2007-03-22 US disclosed
US-7192681-B2 Positive photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 2007-03-20 US disclosed
EP-0178903-A2 Improved tellurium imaging composition and film including imide or ammonium salt ENERGY CONVERSION DEVICES, INC. (US) 1986-04-23 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230355787-A1 COMPOSITIONS AND METHODS FOR PREDICTING RESPONSE TO NAPI2B-TARGETED THERAPY CD79B, NAP1L1, NAP1L4 ADRA2C 3094/4885GSK3A 4268/4885GSK3B 3622/4885
US-20070128555-A1 Novel ester compound, polymer, resist composition, and patterning process C9, RER1, ARF1 ADRA2C 4412/4885GSK3A 3933/4885GSK3B 3874/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.