Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29563566 | 0.94 | — | — | |
| Fluoride Ion SCHEMBL941760 | 0.89 | TSHR (0.36) | TSHR | |
| SCHEMBL7178147 | 0.89 | — | — | |
| Hydrochloric Acid SCHEMBL127178 | 0.89 | TSHR (0.36) | TSHR | |
| Bromide SCHEMBL302580 | 0.89 | TSHR (0.36) | TSHR | |
| Bromide SCHEMBL30477 | 0.89 | TSHR (0.36) | TSHR | |
| Iodide SCHEMBL3863164 | 0.89 | TSHR (0.38) | TSHR | |
| SCHEMBL9752174 | 0.89 | TSHR (0.36) | TSHR | |
| SCHEMBL2862407 | 0.84 | TSHR (0.33) | TSHR | |
| Fluoride Ion SCHEMBL64937 | 0.84 | TSHR (0.33) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1070 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12630744-B2 | Polishing compositions and methods of use thereof | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2026-05-19 | — | — | US | claimed |
| EP-4688987-A1 | POLISHING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2026-02-11 | — | — | EP | claimed |
| EP-3894512-B1 | COMPOSITION AND METHOD FOR SELECTIVELY ETCHING RUTHENIUM AND/OR COPPER | ENTEGRIS INC (US) | 2025-12-24 | — | — | EP | claimed |
| EP-4626996-A1 | POLISHING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2025-10-08 | — | — | EP | claimed |
| US-20250257286-A1 | CLEANING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2025-08-14 | — | — | US | claimed |
| CN-119929834-A | Composition for preparing SSZ-39 molecular sieve and preparation method of SSZ-39 molecular sieve | 中国石油化工股份有限公司 | 2025-05-06 | — | — | CN | claimed |
| CN-119490198-A | High-silicon EMT molecular sieve with EMT topological structure, and synthetic method and application thereof | 中国科学院大连化学物理研究所 | 2025-02-21 | — | — | CN | claimed |
| CN-119490197-A | High-silicon EMT molecular sieve and synthetic method and application thereof | 中国科学院大连化学物理研究所 | 2025-02-21 | — | — | CN | claimed |
| CN-119264480-A | Biomass full-component film and preparation method and application thereof | 无锡小天鹅电器有限公司 | 2025-01-07 | — | — | CN | claimed |
| WO-2024206301-A1 | POLISHING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2024-10-03 | — | — | WO | claimed |
| US-20020143134-A1 | Process for the neutralization of residual acid species in crude dihydric phenols | SABIC INNOVATIVE PLASTICS IP B.V. (NL) | 2002-10-03 | — | — | US | claimed |
| US-6414106-B1 | COMBINING THERMALLY STABLE ORGANIC BASE WITH CRUDE DIHYDRIC PHENOL IN PRESENCE OF SULFONIC ACID COMPOUND, MELTING DIHYDRIC PHENOL AND DIESTER OF CARBONIC ACID, COMBINING MELT WITH CATALYST, OLIGOMERIZING, POLYMERIZING TO POLYCARBONATE | GENERAL ELECTRIC COMPANY | 2002-07-02 | — | — | US | claimed |
| US-6346329-B1 | CURABLE RESIN WITH EPOXIDE GROUPS AND CURING AGENT | KANSAI PAINT CO., LTD. (JP) | 2002-02-12 | — | — | US | claimed |
| US-6316575-B1 | MELT TRANSESTERIFICATION OF DIOL COMPOUND AND CARBOANTE COMPOUND USING CATALYST COMPRISING A PHOSPHORUS-CONTAINING BASIC COMPOUND QUATERNARY PHOSPHONIUM SALT TO FORM POLYCARBONATE | IDEMITSU KOSAN CO., LTD. (JP) | 2001-11-13 | — | — | US | claimed |
| EP-1041115-A2 | Curable resin composition | KANSAI PAINT CO., LTD. (JP) | 2000-10-04 | — | — | EP | claimed |
| EP-0673959-B1 | Process for producing aromatic polycarbonate | MITSUBISHI CHEM CORP (JP) | 1998-10-28 | — | — | EP | claimed |
| US-5527875-A | Process for producing aromatic polycarbonate | MITSUBISHI CHEMICAL CORPORATION (JP) | 1996-06-18 | — | — | US | claimed |
| EP-0673959-A1 | Process for producing aromatic polycarbonate | Mitsubishi Chemical Corporation (JP) | 1995-09-27 | — | — | EP | claimed |
| US-5089450-A | Catalyst for polymerization of organosiloxanes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1992-02-18 | — | — | US | claimed |
| US-4115216-A | QUARTERNARY AMMONIUM COMPOUNDS | HOECHST AKTIENGESELLSCHAFT (DE) | 1978-09-19 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12630744-B2 | Polishing compositions and methods of use thereof | ZAP70, PRKDC, PEAK1 | TSHR 1099/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.