Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1403652 | 0.55 | POLB (0.33) | POLBMAPK1HSD17B10 | |
| SCHEMBL901164 | 0.55 | — | — | |
| SCHEMBL18869 | 0.52 | — | — | |
| SCHEMBL3982057 | 0.45 | — | — | |
| SCHEMBL208338 | 0.45 | — | — | |
| SCHEMBL10422741 | 0.45 | — | — | |
| SCHEMBL14639124 | 0.45 | — | — | |
| SCHEMBL2162036 | 0.45 | — | — | |
| SCHEMBL2162034 | 0.45 | — | — | |
| SCHEMBL3791558 | 0.41 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230288809-A1 | COMPOSITION FOR RESIST UNDERLAYER AND PATTERN FORMATION METHOD USING SAME | SAMSUNG SDI CO., LTD. (KR) | 2023-09-14 | — | — | US | disclosed |
| US-20210236410-A1 | HAIR COSMETIC COMPRISING BLOCK COPOLYMER | SHISEIDO COMPANY, LTD. (JP) | 2021-08-05 | — | — | US | disclosed |
| US-20210236411-A1 | BLOCK COPOLYMER-CONTAINING INORGANIC PARTICLE DISPERSION FOR COSMETICS | SHISEIDO COMPANY, LTD. (JP) | 2021-08-05 | — | — | US | disclosed |
| US-11048169-B2 | Resist underlayer composition, and method of forming patterns using the composition | SAMSUNG SDI CO., LTD. (KR) | 2021-06-29 | — | — | US | disclosed |
| EP-3811924-A1 | BLOCK COPOLYMER-CONTAINING INORGANIC PARTICLE DISPERSION FOR COSMETICS | Shiseido Company, Ltd. (JP) | 2021-04-28 | — | — | EP | disclosed |
| EP-3804691-A1 | HAIR COSMETIC COMPRISING BLOCK COPOLYMER | Shiseido Company, Ltd. (JP) | 2021-04-14 | — | — | EP | disclosed |
| US-20190196332-A1 | RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2019-06-27 | — | — | US | disclosed |
| EP-2311920-B1 | PIGMENT DISPERSIONS, BLOCK POLYMERS AND MANUFACTURING METHOD THEREFOR | DAINICHISEIKA COLOR CHEM (JP) | 2016-10-12 | — | — | EP | disclosed |
| US-8822591-B2 | Pigment dispersions | DAINICHISEIKA COLOR & CHEMICALS MFG. CO., LTD. (JP) | 2014-09-02 | — | — | US | disclosed |
| US-8269047-B2 | Synthesis of alpha-halo enones and enals | BOARD OF REGENTS OF THE NEVADA SYSTEM OF HIGHER EDUCATION, ON BEHALF OF THE UNIVERSITY OF NEVADA, RENO (US) | 2012-09-18 | — | — | US | disclosed |
| US-20110136965-A1 | PIGMENT DISPERSIONS, BLOCK POLYMERS AND MANUFACTURING METHOD THEREFOR | DAINICHISEIKA COLOR & CHEMICALS MFG. CO., LTD. (JP) | 2011-06-09 | — | — | US | disclosed |
| EP-2311920-A1 | PIGMENT DISPERSIONS, BLOCK POLYMERS AND MANUFACTURING METHOD THEREFOR | Dainichiseika Color & Chemicals Mfg. Co., Ltd. (JP) | 2011-04-20 | — | — | EP | disclosed |
| US-20110021806-A1 | SYNTHESIS OF ALPHA-HALO ENONES AND ENALS | Board of Regents of the Nevada System of Higher Education, on behalf of the Univ of Nevada, Reno (US) | 2011-01-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210236411-A1 | BLOCK COPOLYMER-CONTAINING INORGANIC PARTICLE DISPERSION FOR COSMETICS | H1-0, H1-4, H1-2 | POLB 34/4885MAPK1 1286/4885HSD17B10 715/4885 |
| US-20210236410-A1 | HAIR COSMETIC COMPRISING BLOCK COPOLYMER | DNMT1, H1-0, H1-5 | POLB 45/4885MAPK1 1847/4885HSD17B10 65/4885 |
| US-20110021806-A1 | SYNTHESIS OF ALPHA-HALO ENONES AND ENALS | ADH1C, ADH1A, AP1S1 | POLB 923/4885MAPK1 3081/4885HSD17B10 206/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.