SCHEMBL107407

SCHEMBL107407

COc1ccc(N(CCO)CCO)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PRUNE1 Q86TP1 1/20 0.47
CA12 O43570 1/20 0.46
CA1 P00915 1/20 0.46
CA2 P00918 1/20 0.46
CA7 P43166 1/20 0.46
CA9 Q16790 1/20 0.46
CA14 Q9ULX7 1/20 0.46
MAPT P10636 5/20 0.43
SMN1; SMN2 Q16637 4/20 0.43
NPC1 O15118 3/20 0.43
RAB9A P51151 3/20 0.43
TP53 P04637 1/20 0.43
ESR2 Q92731 1/20 0.43
NOX1 Q9Y5S8 1/20 0.43
KEAP1 Q14145 1/20 0.42
NFE2L2 Q16236 1/20 0.42
SLC2A1 P11166 1/20 0.41
MMP1 P03956 1/20 0.41
MMP7 P09237 1/20 0.41
MMP8 P22894 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19831100 0.89 GSK3B (0.46) PRUNE1MAPTSMN1; SMN2NPC1RAB9A
SCHEMBL13725780 0.89 GSK3B (0.46) PRUNE1MAPTSMN1; SMN2NPC1RAB9A
SCHEMBL20870850 0.87 PRUNE1 (0.48) PRUNE1MAPTSMN1; SMN2MAPK1ALDH1A1
SCHEMBL14266221 0.83 ABCB11 (0.46) PRUNE1MAPTSMN1; SMN2NPC1RAB9A
SCHEMBL9624359 0.82 MAPT (0.55) PRUNE1MAPTSMN1; SMN2NPC1RAB9A
SCHEMBL22340859 0.82 CNR2 (0.51) PRUNE1MAPTSMN1; SMN2MAPK1ALDH1A1
SCHEMBL20871874 0.82 CNR2 (0.51) PRUNE1MAPTSMN1; SMN2MAPK1ALDH1A1
SCHEMBL6243535 0.82 MAPT (0.44) MAPTSMN1; SMN2NPC1RAB9ATP53
SCHEMBL15466179 0.82 RPS6KA2 (0.45) CA12CA1CA2CA7CA9
SCHEMBL3945201 0.81 CA12 (0.48) CA12CA1CA2CA7CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 123 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11656548-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, mask blank with resist film, method for producing photomask, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2023-05-23 US disclosed
CN-109153934-B Polyester dispersants, synthesis and uses thereof 雪佛龙奥伦耐有限责任公司 2022-04-05 CN disclosed
US-20220049039-A1 RADICAL POLYMERIZABLE RESIN COMPOSITION AND STRUCTURE REPAIRING MATERIAL SHOWA DENKO K.K. (JP) 2022-02-17 US disclosed
US-20210283655-A1 STRUCTURE REPAIRING METHOD SHOWA DENKO K.K. (JP) 2021-09-16 US disclosed
EP-3858805-A1 STRUCTURE REPAIRING METHOD Showa Denko K.K. (JP) 2021-08-04 EP disclosed
EP-3858880-A1 RADICAL POLYMERIZABLE RESIN COMPOSITION AND STRUCTURE REPAIRING MATERIAL Showa Denko K.K. (JP) 2021-08-04 EP disclosed
US-20210214471-A1 RADICALLY POLYMERIZABLE PUTTY-LIKE RESIN COMPOSITION, SEALING AGENT AND CRACK REPAIRING METHOD SHOWA DENKO K.K. (JP) 2021-07-15 US disclosed
EP-3731016-A1 ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, MASK BLANK WITH RESIST FILM, METHOD FOR MANUFACTURING PHOTOMASK, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE Fujifilm Corporation (JP) 2020-10-28 EP disclosed
EP-2681623-B1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FUJIFILM CORP (JP) 2019-07-10 EP disclosed
US-10000452-B1 Quinolone-based compounds, formulations, and uses thereof UNIVERSITY OF SOUTH FLORIDA (US) 2018-06-19 US disclosed
US-20090111047-A1 POSITIVE RESIST COMPOSITION FOR ELECTRON BEAM, X-RAY OR EUV AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-30 US disclosed
US-20090087784-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-20090087776-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-20090087789-A1 RESIST COMPOSITION AND PATTERN-FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed
US-20070224540-A1 Positive resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2007-09-27 US disclosed
US-6133446-A Heterocyclic compounds for the treatment of CNS and cardiovascular disorders PHARMACIA & UPJOHN COMPANY (US) 2000-10-17 US disclosed
EP-0737189-B1 HETEROCYCLIC COMPOUNDS FOR THE TREATMENT OF CNS AND CARDIOVASCULAR DISORDERS UPJOHN CO (US) 1999-07-28 EP disclosed
EP-0737189-A1 HETEROCYCLIC COMPOUNDS FOR THE TREATMENT OF CNS AND CARDIOVASCULAR DISORDERS PHARMACIA & UPJOHN COMPANY (US) 1996-10-16 EP disclosed
WO-1995018118-A1 HETEROCYCLIC COMPOUNDS FOR THE TREATMENT OF CNS AND CARDIOVASCULAR DISORDERS THE UPJOHN COMPANY (US) 1995-07-06 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10000452-B1 Quinolone-based compounds, formulations, and uses thereof RECQL, NQO1, NQO2 PRUNE1 3322/4885CA12 4643/4885CA1 4827/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.