Known targets — ChEMBL curated mechanism
ACHECHKACHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGHRH2OPRM1
The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE known ✓ | P22303 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | TSHR | P16473 | 3/20 | 0.36 |
| ▸ | MAOB | P27338 | 8/20 | 0.35 |
| ▸ | MAOA | P21397 | 7/20 | 0.35 |
| ▸ | KDM1A | O60341 | 5/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 4/20 | 0.35 |
| ▸ | LMNA | P02545 | 4/20 | 0.35 |
| ▸ | CYP2B6 | P20813 | 3/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.35 |
| ▸ | TAAR1 | Q96RJ0 | 2/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | HTR1A | P08908 | 1/20 | 0.35 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.35 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.35 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.35 |
| ▸ | HTR2C | P28335 | 1/20 | 0.35 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL31409180 | 1.00 | ALDH1A1 (0.38) | ALDH1A1TSHRMAOBMAOAKDM1A | |
| SCHEMBL36560 | 0.96 | ALDH1A1 (0.40) | ALDH1A1TSHRMAOBMAOAKDM1A | |
| Iodide SCHEMBL106599 | 0.92 | ALDH1A1 (0.38) | ALDH1A1TSHRMAOBMAOAKDM1A | |
| SCHEMBL12762155 | 0.92 | ALDH1A1 (0.38) | ALDH1A1TSHRMAOBMAOAKDM1A | |
| Hydrochloric Acid SCHEMBL5547286 | 0.92 | MAOB (0.39) | ALDH1A1TSHRMAOBMAOAKDM1A | |
| Fluoride Ion SCHEMBL25292299 | 0.92 | ALDH1A1 (0.39) | ALDH1A1TSHRMAOBMAOAKDM1A | |
| SCHEMBL2058395 | 0.92 | ALDH1A1 (0.38) | ALDH1A1TSHRMAOBMAOAKDM1A | |
| Fluoride Ion SCHEMBL216895 | 0.92 | ALDH1A1 (0.39) | ALDH1A1TSHRMAOBMAOAKDM1A | |
| Water SCHEMBL105507 | 0.92 | ALDH1A1 (0.38) | ALDH1A1TSHRMAOBMAOAKDM1A | |
| Hydrochloric Acid SCHEMBL15641 | 0.92 | ALDH1A1 (0.38) | ALDH1A1TSHRMAOBMAOAKDM1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 571 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025106936-A1 | POLY(METH)ACRYLIMIDE MATERIALS WITH ENHANCED THERMOMECHANICAL PROPERTIES | GENCORES, INC. (US) | 2025-05-22 | — | — | WO | claimed |
| WO-2024216910-A1 | HIGH-CHEMICAL-RESISTANCE POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PREPARATION METHOD THEREFOR, AND USE THEREOF | 明士(北京)新材料开发有限公司 | 2024-10-24 | — | — | WO | claimed |
| CN-115198544-B | Light-induced silk active grafting dyeing method | 浙江理工大学 | 2024-07-02 | — | — | CN | claimed |
| CN-116836389-B | Low-temperature-curable positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-01-26 | — | — | CN | claimed |
| CN-116836389-A | Low-temperature-curable positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-10-03 | — | — | CN | claimed |
| CN-116068852-B | Positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-07-14 | — | — | CN | claimed |
| CN-116149140-B | Positive photosensitive resin composition with high chemical resistance and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-07-14 | — | — | CN | claimed |
| CN-116149140-A | Positive photosensitive resin composition with high chemical resistance and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-05-23 | — | — | CN | claimed |
| CN-116068852-A | Positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-05-05 | — | — | CN | claimed |
| US-11491711-B2 | Method of making 3D printed objects using two distinct light sources | PHOTOCENTRIC LIMITED (GB) | 2022-11-08 | — | — | US | claimed |
| US-20160222762-A1 | DIPHENYLIODONIUM SALTS AS SULFIDOGENESIS INHIBITORS AND ANTIMICROBIALS | NORRIS RODS, INC., | 2016-08-04 | — | — | US | claimed |
| US-7851115-B2 | Iodonium hole blocking layer photoconductors | XEROX CORPORATION (US) | 2010-12-14 | — | — | US | claimed |
| US-20090035676-A1 | IODONIUM HOLE BLOCKING LAYER PHOTOCONDUCTORS | XEROX CORPORATION (US) | 2009-02-05 | — | — | US | claimed |
| US-20080176678-A1 | Compositions for Use in Golf Balls | ACUSHNET COMPANY | 2008-07-24 | — | — | US | claimed |
| US-6120968-A | LIGHT SENSITIVE RECORDING MEDIA AND REFLECTANCE | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2000-09-19 | — | — | US | claimed |
| US-6117609-A | MICROCAPSULES COMPRISE A PHOTOPOLYMERIZABLE UNSATURATED COMPOUND AND A PHOSPHITE HAVING AT LEAST ONE THIO LINKAGE; COLORANT AS A PHOTOSENSITIZER; HARDENING USING LOW ENERGY; ANTISOILANTS | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 2000-09-12 | — | — | US | claimed |
| US-5955237-A | CATIONIC CYANINE DYE SENSITIZER; CATHODE RAY TUBES; LIGHT EMITTING DEVICES | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 1999-09-21 | — | — | US | claimed |
| EP-0884650-A1 | Photosensitive recording material using microcapsules | Brother Kogyo Kabushiki Kaisha (JP) | 1998-12-16 | — | — | EP | claimed |
| US-5516621-A | Photosensitive microcapsule having increased photosensitive sensitivity | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 1996-05-14 | — | — | US | claimed |
| US-5466556-A | Photosensitive microencapsulated toner | BROTHER KOGYO KABUSHIKI KAISHA (JP) | 1995-11-14 | — | — | US | claimed |