Fluoride Ion

Fluoride Ion

SCHEMBL216895

[F-].c1ccc([I+]c2ccccc2)cc1

nearest known ligand 0.39

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.39
TSHR P16473 2/20 0.36
HTR3E A5X5Y0 1/20 0.36
SLC22A2 O15244 1/20 0.36
SLC22A1 O15245 1/20 0.36
SLC22A3 O75751 1/20 0.36
HTR3B O95264 1/20 0.36
PLAU P00749 1/20 0.36
HTR3A P46098 1/20 0.36
HTR3D Q70Z44 1/20 0.36
HTR3C Q8WXA8 1/20 0.36
MAOB P27338 8/20 0.35
MAOA P21397 7/20 0.35
KDM1A O60341 5/20 0.35
CYP2C19 P33261 4/20 0.35
CYP2B6 P20813 3/20 0.35
LMNA P02545 3/20 0.35
CYP1A2 P05177 2/20 0.35
CYP2D6 P10635 2/20 0.35
CYP2C9 P11712 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride Ion SCHEMBL25292299 1.00 ALDH1A1 (0.39) ALDH1A1TSHRHTR3ESLC22A2SLC22A1
Fluoride Ion SCHEMBL2032494 0.96 ALDH1A1 (0.37) ALDH1A1TSHRHTR3ESLC22A2SLC22A1
SCHEMBL36560 0.96 ALDH1A1 (0.40) ALDH1A1TSHRMAOBMAOAKDM1A
Fluoride SCHEMBL125007 0.93 ALDH1A1 (0.35) ALDH1A1TSHRHTR3ESLC22A2SLC22A1
Fluoride SCHEMBL125006 0.93 ALDH1A1 (0.35) ALDH1A1TSHRHTR3ESLC22A2SLC22A1
Hydrochloric Acid SCHEMBL15641 0.92 ALDH1A1 (0.38) ALDH1A1TSHRMAOBMAOAKDM1A
Water SCHEMBL105507 0.92 ALDH1A1 (0.38) ALDH1A1TSHRMAOBMAOAKDM1A
SCHEMBL12762155 0.92 ALDH1A1 (0.38) ALDH1A1TSHRMAOBMAOAKDM1A
Bromide SCHEMBL107424 0.92 ALDH1A1 (0.38) ALDH1A1TSHRMAOBMAOAKDM1A
SCHEMBL2058395 0.92 ALDH1A1 (0.38) ALDH1A1TSHRMAOBMAOAKDM1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 379 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115198544-A Photoinduction-based silk active grafting dyeing method 浙江理工大学 2022-10-18 CN claimed
CN-111484529-A Method for synthesizing tenofovir monophenyl ester 奥锐特药业股份有限公司 2020-08-04 CN claimed
US-8647526-B2 Two component etching MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 2014-02-11 US claimed
US-20120085965-A1 TWO COMPONENT ETCHING MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 2012-04-12 US claimed
EP-2438140-A1 TWO COMPONENT ETCHING Merck Patent GmbH (DE) 2012-04-11 EP claimed
WO-2010139390-A1 TWO COMPONENT ETCHING MERCK PATENT GMBH (DE) 2010-12-09 WO claimed
JP-63005041-A None JP disclosed
US-12077658-B2 Shaped dielectric component cross-linked via irradiation and method of making thereof ROGERS CORPORATION (US) 2024-09-03 US disclosed
CN-115198544-B Light-induced silk active grafting dyeing method 浙江理工大学 2024-07-02 CN disclosed
EP-1911814-B2 Methods for preparing curable pigment inkjet ink sets AGFA NV (BE) 2023-07-12 EP disclosed
CN-115198544-A Photoinduction-based silk active grafting dyeing method 浙江理工大学 2022-10-18 CN disclosed
EP-2740773-B2 Curable pigment inkjet ink sets and methods for preparing the said ink sets AGFA NV (BE) 2022-10-05 EP disclosed
CN-114729156-A Shaped dielectric component crosslinked by irradiation and method of making same 罗杰斯公司 2022-07-08 CN disclosed
US-20050190245-A1 Ink-jet printing system AGFA-GEVAERT (BE) 2005-09-01 US disclosed
US-20050168550-A1 Ink-jet printing process and ink-jet inks used therein AGFA NV (BE) 2005-08-04 US disclosed
US-20040244643-A1 UV-absorbing ink composition for ink-jet printing AGFA GRAPHICS NV (BE) 2004-12-09 US disclosed
EP-1484368-A1 UV-absorbing ink composition for ink-jet printing Agfa-Gevaert (BE) 2004-12-08 EP disclosed
EP-1483346-A1 INK-JET PRINTING PROCESS AND INK-JET INKS USED THEREIN Dotrix NV (BE) 2004-12-08 EP disclosed
WO-2003074619-A1 INK-JET PRINTING PROCESS AND INK-JET INKS USED THEREIN DOTRIX NV (BE) 2003-09-12 WO disclosed
JP-S635041-A PRODUCTION OF DIARYL IODONIUM FLUORIDE SAGAMI CHEM RES CENTER 1988-01-11 JP disclosed