Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | TSHR | P16473 | 4/20 | 0.38 |
| ▸ | MAOB | P27338 | 8/20 | 0.36 |
| ▸ | MAOA | P21397 | 7/20 | 0.36 |
| ▸ | KDM1A | O60341 | 5/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 4/20 | 0.36 |
| ▸ | CYP2B6 | P20813 | 3/20 | 0.36 |
| ▸ | LMNA | P02545 | 3/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.36 |
| ▸ | TAAR1 | Q96RJ0 | 2/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | HTR1A | P08908 | 1/20 | 0.36 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.36 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.36 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.36 |
| ▸ | HTR2C | P28335 | 1/20 | 0.36 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.36 |
| ▸ | DRD3 | P35462 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Iodide SCHEMBL106599 | 0.96 | ALDH1A1 (0.38) | ALDH1A1TSHRMAOBMAOAKDM1A | |
| Hydrochloric Acid SCHEMBL5547286 | 0.96 | MAOB (0.39) | ALDH1A1TSHRMAOBMAOAKDM1A | |
| SCHEMBL2058395 | 0.96 | ALDH1A1 (0.38) | ALDH1A1TSHRMAOBMAOAKDM1A | |
| Hydrochloric Acid SCHEMBL15641 | 0.96 | ALDH1A1 (0.38) | ALDH1A1TSHRMAOBMAOAKDM1A | |
| Fluoride Ion SCHEMBL216895 | 0.96 | ALDH1A1 (0.39) | ALDH1A1TSHRMAOBMAOAKDM1A | |
| Fluoride Ion SCHEMBL25292299 | 0.96 | ALDH1A1 (0.39) | ALDH1A1TSHRMAOBMAOAKDM1A | |
| SCHEMBL12762155 | 0.96 | ALDH1A1 (0.38) | ALDH1A1TSHRMAOBMAOAKDM1A | |
| Water SCHEMBL105507 | 0.96 | ALDH1A1 (0.38) | ALDH1A1TSHRMAOBMAOAKDM1A | |
| Bromide SCHEMBL107424 | 0.96 | ALDH1A1 (0.38) | ALDH1A1TSHRMAOBMAOAKDM1A | |
| Hydrochloric Acid SCHEMBL31173672 | 0.96 | MAOB (0.39) | ALDH1A1TSHRMAOBMAOAKDM1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 12189 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4744663-A2 | SKIN COMPOSITION | Eaderm Co., Ltd. (JP) | 2026-05-20 | — | — | EP | claimed |
| EP-3685231-B1 | 3D PRINTING WITH POLYMERIC NANOGEL PARTICLES | THE REGENTS OF THE UNIV OF COLORADO A BODY CORPORATE A COLORADO NON PROFIT (US) | 2026-05-13 | — | — | EP | claimed |
| US-20260098070-A1 | SMAGP FUSION MOLECULES AND METHODS OF USE THEREOF | DEM BIOPHARMA INC (US) | 2026-04-09 | — | — | US | claimed |
| EP-4469534-B1 | COMPOSITION AND METHOD FOR FORMING AN ELECTROCHROMIC LAYER | AMPERIAL TECH GMBH (DE) | 2026-03-04 | — | — | EP | claimed |
| US-20260029711-A1 | ENHANCED EUV MATERIALS, PHOTORESISTS AND METHODS OF THEIR USE. | IRRESISTIBLE MATERIALS LTD (GB) | 2026-01-29 | — | — | US | claimed |
| US-20250377591-A1 | PHOTORESIST COMPOSITION AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE | SAMSUNG ELECTRONICS CO LTD (KR) | 2025-12-11 | — | — | US | claimed |
| US-12486341-B2 | Photocurable compositions and methods of use thereof | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2025-12-02 | — | — | US | claimed |
| US-20250346737-A1 | RADIATION INDUCED RADICAL CURING BY SEMICONDUCTING NANOPARTICLES | YEDA RESEARCH AND DEVELOPMENT CO. LTD. (IL) | 2025-11-13 | — | — | US | claimed |
| EP-4646427-A2 | SMAGP FUSION MOLECULES AND METHODS OF USE THEREOF | DEM Biopharma, Inc. (US) | 2025-11-12 | — | — | EP | claimed |
| US-20250311689-A1 | SEEDLING GERMINATION AND GROWTH CONDITIONS | PIONEER HI-BRED INTERNATIONAL, INC. (US) | 2025-10-09 | — | — | US | claimed |
| EP-0178208-A1 | Photosensitive film of a silicon-containing polymer and its use as a mask in photolithographic processes | COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) | 1986-04-16 | — | — | EP | claimed |
| US-4560709-A | CONTAINING DUAL CATALYST OF AROMATIC IODONIUM SALT AND AROMATIC OXY KETONE | CIBA GEIGY CORPORATION (US) | 1985-12-24 | — | — | US | claimed |
| US-4537854-A | Photoresist compositions and method | GENERAL ELECTRIC COMPANY (US) | 1985-08-27 | — | — | US | claimed |
| EP-0014785-B1 | COATING METHOD AND CURABLE COMPOSITIONS | GENERAL ELECTRIC COMPANY (US) | 1985-06-12 | — | — | EP | claimed |
| US-4416752-A | CATIONIC POLYMER CONTAINING ARYLIODONIUM OR ARYLSULFONIUM SALT | GENERAL ELECTRIC COMPANY (US) | 1983-11-22 | — | — | US | claimed |
| US-4398013-A | HALOGENONIUM SALT | GENERAL ELECTRIC COMPANY (US) | 1983-08-09 | — | — | US | claimed |
| US-4388450-A | THERMAL CURING CATALYSTS, QUICK-SETTING; | GENERAL ELECTRIC COMPANY (US) | 1983-06-14 | — | — | US | claimed |
| US-4386154-A | ACYLATED LEUCO DYES | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1983-05-31 | — | — | US | claimed |
| US-4383903-A | POLYFUNCTIONAL AROMATIC CYANATE, ACRYLIC COMPOUND, POLYFUNCTIONAL MALEIMIDE, PHOTOINITIATOR | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1983-05-17 | — | — | US | claimed |
| US-4329300-A | Method for making diaryliodonium polyhalometalloid salts | GENERAL ELECTRIC COMPANY (US) | 1982-05-11 | — | — | US | claimed |