Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 5/20 | 0.38 |
| ▸ | CA2 | P00918 | 5/20 | 0.38 |
| ▸ | CA12 | O43570 | 2/20 | 0.38 |
| ▸ | CA7 | P43166 | 2/20 | 0.38 |
| ▸ | CA13 | Q8N1Q1 | 2/20 | 0.38 |
| ▸ | MMP1 | P03956 | 1/20 | 0.33 |
| ▸ | MMP2 | P08253 | 1/20 | 0.33 |
| ▸ | MMP9 | P14780 | 1/20 | 0.33 |
| ▸ | MMP8 | P22894 | 1/20 | 0.33 |
| ▸ | MMP13 | P45452 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | F2 | P00734 | 1/20 | 0.30 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.30 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.30 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23802285 | 0.95 | CA1 (0.40) | CA1CA2CA12CA7CA13 | |
| SCHEMBL16749589 | 0.93 | CA1 (0.33) | CA1CA2CA12CA7CA13 | |
| SCHEMBL20847605 | 0.90 | CA1 (0.35) | CA1CA2CA12CA7CA13 | |
| SCHEMBL12433063 | 0.88 | CA1 (0.45) | CA1CA2CA12CA7CA13 | |
| SCHEMBL23802289 | 0.86 | CA12 (0.31) | CA1CA2CA12CA7CA13 | |
| SCHEMBL24460050 | 0.86 | CA1 (0.42) | CA1CA2CA12CA7CA13 | |
| SCHEMBL777917 | 0.85 | CA1 (0.50) | CA1CA2CA12CA7CA13 | |
| SCHEMBL24843790 | 0.84 | CA1 (0.40) | CA1CA2CA12CA7CA13 | |
| SCHEMBL27019945 | 0.80 | TAS1R3 (0.31) | — | |
| SCHEMBL12629275 | 0.80 | CA1 (0.39) | CA1CA2CA12CA7CA13 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240018153-A1 | BENZENESULFONAMIDE DERIVATIVES AND USES THEREOF | 2692372 ONTARIO, INC. (CA) | 2024-01-18 | — | — | US | disclosed |
| US-20230309388-A1 | ORGANIC ELECTROLUMINESCENT MATERIAL AND DEVICE | Beijing Summer Sprout Technology Co., Ltd. (CN) | 2023-09-28 | — | — | US | disclosed |
| US-11466026-B2 | Organic electroluminescent materials and devices | Beijing Summer Sprout Technology Co., Ltd. (CN) | 2022-10-11 | — | — | US | disclosed |
| US-20200062778-A1 | ORGANIC ELECTROLUMINESCENT MATERIALS AND DEVICES | Beijing Summer Sprout Technology Co., Ltd. (CN) | 2020-02-27 | — | — | US | disclosed |
| WO-2019056120-A1 | PENTAFLUOROPHENYL SULFONAMIDE COMPOUNDS, COMPOSITIONS AND USES THEREOF | DALRIADA THERAPEUTICS INC. (CA) | 2019-03-28 | — | — | WO | disclosed |
| US-9551935-B2 | Pattern forming method and resist composition | FUJIFILM CORPORATION (JP) | 2017-01-24 | — | — | US | disclosed |
| US-20160358777-A1 | RESIST UNDER LAYER FILM COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-08 | — | — | US | disclosed |
| US-20160313645-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-10-27 | — | — | US | disclosed |
| US-9223219-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film | FUJIFILM CORPORATION (JP) | 2015-12-29 | — | — | US | disclosed |
| US-9116437-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2015-08-25 | — | — | US | disclosed |
| US-20120171618-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING A PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-07-05 | — | — | US | disclosed |
| US-20120148957-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20120058427-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-03-08 | — | — | US | disclosed |
| US-20110318687-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110269072-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-11-03 | — | — | US | disclosed |
| US-20110236828-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-09-29 | — | — | US | disclosed |
| US-20110183258-A1 | POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND FOR USE IN THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-07-28 | — | — | US | disclosed |
| US-20110143280-A1 | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2011-06-16 | — | — | US | disclosed |
| US-20110136062-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-06-09 | — | — | US | disclosed |
| US-20110014571-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-01-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11466026-B2 | Organic electroluminescent materials and devices | OCIAD1, OCIAD2, SLCO4C1 | CA1 4826/4885CA2 4162/4885CA12 4728/4885 |
| US-20200062778-A1 | ORGANIC ELECTROLUMINESCENT MATERIALS AND DEVICES | OCIAD1, OCIAD2, SLCO4C1 | CA1 4826/4885CA2 4162/4885CA12 4728/4885 |
| US-20230309388-A1 | ORGANIC ELECTROLUMINESCENT MATERIAL AND DEVICE | OCIAD1, OCIAD2, SLCO4C1 | CA1 3713/4885CA2 3579/4885CA12 3711/4885 |
| US-20110183258-A1 | POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND FOR USE IN THE COMPOSITION | CROCC, ACTR2, MRE11 | CA1 1240/4885CA2 1811/4885CA12 2071/4885 |
| US-20240018153-A1 | BENZENESULFONAMIDE DERIVATIVES AND USES THEREOF | ABCG2, ABCB1, ARSA | CA1 4541/4885CA2 3215/4885CA12 2893/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.