Malonic Acid

Malonic Acid

SCHEMBL10783258

CC(=CCC(CO)(CO)CO)C(=O)O.O=C(O)CC(=O)O

nearest known ligand 0.35

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Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
LDHA P00338 1/20 0.35
SRR Q9GZT4 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1142231 0.92 CD81 (0.31)
Succinic Acid SCHEMBL10783771 0.89 LMNA (0.38)
Itaconate SCHEMBL10783955 0.88 ALOX15 (0.46)
SCHEMBL28431090 0.88 CD81 (0.31)
Adipic Acid SCHEMBL10786137 0.85 LMNA (0.39)
SCHEMBL10346801 0.85 CD81 (0.30)
Sebacic Acid SCHEMBL10782885 0.84 TSHR (0.41)
SCHEMBL2537050 0.82
SCHEMBL27083581 0.82
Malonic Acid SCHEMBL10786720 0.81 CD81 (0.33) LDHASRR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0102830-B1 DELUSTERING COATING COMPOSITION EXCELLENT IN ABRASION RESISTANCE MITSUBISHI RAYON CO., LTD. (JP) 1987-05-27 EP disclosed
US-4518472-A COMPOUND CONTAINING AT LEAST THREE (METH)ACRYLOYLOXY GROUPS, PHOTOSENSITIZER, EMULSION-TYPE CROSSLINKED POLYMER MITSUBISHI RAYON COMPANY LTD. (JP) 1985-05-21 US disclosed