Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 1/20 | 0.62 |
| ▸ | CA7 | P43166 | 1/20 | 0.62 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.62 |
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.52 |
| ▸ | TSHR | P16473 | 4/20 | 0.52 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.52 |
| ▸ | POLB | P06746 | 3/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL38664524 | 0.84 | — | — | |
| SCHEMBL21033830 | 0.78 | POLB (0.40) | CA12CA7CA14SMN1; SMN2TSHR | |
| SCHEMBL526119 | 0.77 | CA12 (0.52) | CA12CA7CA14SMN1; SMN2TSHR | |
| SCHEMBL4724826 | 0.77 | CA12 (1.00) | CA12CA7CA14SMN1; SMN2TSHR | |
| SCHEMBL490315 | 0.74 | CA12 (0.65) | CA12CA7CA14SMN1; SMN2TSHR | |
| SCHEMBL222875 | 0.74 | CA12 (0.65) | CA12CA7CA14SMN1; SMN2TSHR | |
| SCHEMBL26560789 | 0.74 | CA12 (0.50) | CA12CA7CA14SMN1; SMN2TSHR | |
| SCHEMBL20470599 | 0.74 | CA12 (0.50) | CA12CA7CA14SMN1; SMN2TSHR | |
| SCHEMBL898965 | 0.74 | CA12 (0.65) | CA12CA7CA14SMN1; SMN2TSHR | |
| SCHEMBL31071498 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112121852-B | Catalyst composition and use of catalyst composition or catalyst for catalyzing nucleophilic substitution reaction | 中山大学 | 2021-09-24 | — | — | CN | disclosed |
| CN-112121852-A | Catalyst composition and use of catalyst composition or catalyst for catalyzing nucleophilic substitution reaction | 中山大学 | 2020-12-25 | — | — | CN | disclosed |
| EP-2343299-B9 | Heteroaryl substituted pyrrolo[2,3-b]pyridines and pyrrolo[2,3-b]pyrimidines as Janus kinase inhibitors | INCYTE HOLDINGS CORP (US) | 2017-03-08 | — | — | EP | disclosed |
| US-9551935-B2 | Pattern forming method and resist composition | FUJIFILM CORPORATION (JP) | 2017-01-24 | — | — | US | disclosed |
| US-20160313645-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-10-27 | — | — | US | disclosed |
| US-9116437-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2015-08-25 | — | — | US | disclosed |
| US-9012123-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2015-04-21 | — | — | US | disclosed |
| US-8906253-B2 | Gap embedding composition, method of embedding gap and method of producing semiconductor device by using the composition | FUJIFILM CORPORATION (JP) | 2014-12-09 | — | — | US | disclosed |
| US-20140322914-A1 | GAP EMBEDDING COMPOSITION, METHOD OF EMBEDDING GAP AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE BY USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2014-10-30 | — | — | US | disclosed |
| US-8771916-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2014-07-08 | — | — | US | disclosed |
| US-8148044-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2012-04-03 | — | — | US | disclosed |
| US-20120058427-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-03-08 | — | — | US | disclosed |
| US-8084183-B2 | Resist composition for electron beam, X-ray, or EUV, and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2011-12-27 | — | — | US | disclosed |
| US-20110269072-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-11-03 | — | — | US | disclosed |
| US-20110236828-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-09-29 | — | — | US | disclosed |
| US-8017299-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2011-09-13 | — | — | US | disclosed |
| US-20110183258-A1 | POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND FOR USE IN THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-07-28 | — | — | US | disclosed |
| US-20110014571-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-01-20 | — | — | US | disclosed |
| US-20100136479-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-06-03 | — | — | US | disclosed |
| US-20080292989-A1 | POSITIVE WORKING PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-11-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100136479-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | AFF1, F12, AFF2 | CA12 2157/4885CA7 1171/4885CA14 1912/4885 |
| US-20110183258-A1 | POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND FOR USE IN THE COMPOSITION | CROCC, ACTR2, MRE11 | CA12 2071/4885CA7 1075/4885CA14 1890/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.